Magnetic probe device

Abstract

The invention discloses a magnetic probe device. The magnetic probe device comprises a magnetic probe body and a signal processing circuit; the output end of the magnetic probe body is connected withthe input end of the signal processing circuit; the signal processing circuit comprises a first capacitor, a second capacitor, a Faraday shielding device and a boosting transformer; the Faraday shielding device is fixed between a primary side coil and a secondary side coil of the boosting transformer; the primary side coil of the boosting transformer is provided with a center tap, and the center tap is grounded; and the first end of the primary side coil is connected with the first capacitor in series, and the second end of the primary side coil is connected with the second capacitor in series. By adopting the magnetic probe device, the signal-to-noise ratio of the magnetic probe can be improved, and the measuring precision of a magnetic field in plasmas can be improved.

Description

technical field [0001] The invention relates to the field of magnetic diagnosis, in particular to a magnetic probe device. Background technique [0002] Capacitively coupled plasma (CCP) and inductively coupled plasma (ICP) have been widely used in chip production, solar cell preparation, flat panel display manufacturing and micro-electromechanical processing and other fields. Plasma material handling and processing has become a core technology in the semiconductor industry. In order to optimize process parameters, save costs, and increase production capacity, people use various technical means to perform in-situ diagnosis of important parameters in the plasma source. [0003] Magnetic probes are important tools for measuring electromagnetic fields in plasma space, and have been used in nuclear fusion devices, magnetic mirror devices, radio frequency plasma sources, and explosive plasmas. A typical magnetic probe has a very simple structure, usually made of several turns o...

AI Technical Summary

Problems solved by technology

However, in a capacitively coupled plasma source, since the discharge is driven by an electric field, the magnetic field in the space is weak, so the magnetic field measurement is relatively difficult

In addition, the capacitive coupling between the probe and the plasma potential will also generate interference signals, which seriously affect the measurement of the magnetic field, resulting in low measurement accuracy of the magnetic probe.

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