Application of a Tantalum-Uranium-Doped Thin Film in Black Cavity
A film and black cavity technology, applied in the application field of tantalum-doped uranium film, can solve the problems of insufficient gold-lined laser-X-ray conversion efficiency, high M-band X-ray yield, unstable black cavity structure, etc. The effect of interfacial adhesion and chemical compatibility, improved oxidation corrosion resistance, and superior physical properties of black cavity
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specific Embodiment approach 1
[0007] Specific implementation mode 1: This implementation mode is an application of a tantalum-uranium thin film on a black cavity. The tantalum-uranium thin film is used as a black cavity inner lining protection layer, or is applied on a black cavity as an energy conversion layer.
[0008] The tantalum-doped uranium thin film is used as the lining protective layer. While protecting the energy conversion layer of the uranium black cavity, the tantalum-doped uranium also has better interface bonding force and chemical compatibility, and higher energy coupling efficiency.
[0009] Tantalum-doped uranium film is used as the energy conversion layer. Compared with Au, tantalum-doped uranium has higher laser-X-ray conversion efficiency and lower M-band X-ray yield. Compared with U, it has outstanding chemical stability and structural reliability. .
specific Embodiment approach 2
[0010] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the tantalum content in the tantalum-doped uranium thin film is 3 at% to 12 at%. Others are the same as the first embodiment.
specific Embodiment approach 3
[0011] Embodiment 3: This embodiment differs from Embodiment 1 or Embodiment 2 in that: the tantalum-doped uranium thin film is prepared by double-target magnetron sputtering co-deposition method. Others are the same as those in Embodiment 1 or 2.
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