31results about How to "Good oxidation and corrosion resistance" patented technology

The invention discloses an abrasion-proof and corrosion-resistant nickel-based alloy wire and a preparation method thereof. The alloy wire comprises the following components: 17-21% of C, 20-25% of Co, 1.8-2.2% of W, 6.4-9.5% of Mo, 1.4-1.8% of Al, 3.2-4.5% of Ti, 0.1-0.5% of Nb, 0.1-0.5% of Hf, 1.2-1.8% of Ta, 0.03-0.06% of Re, 0.01-0.05% of Ce, 0.02-0.1% of C, 0.005-0.015% of B, 0.02-0.07% of Zr, 0.005-0.008% of Mg, and the balance Ni. The preparation technology of the alloy comprises the steps of vacuum smelting, remelting, forging, hot rolling, drawing, solid solution treatment and aging treatment, namely, raw materials are prepared and smelted based on mass percent and then smelted; the smelted materials are forged and rolled into obtain alloyed wire rods; the alloyed wire rods are drawn at a plurality of times to obtain phi 0.05-0.4mm alloy wires; finally the alloy wires are subjected to solid solution treatment and aging treatment. The abrasion-proof and corrosion-resistant nickel-based alloy wire can be used as a brush wire material for brush sealing of an aircraft engine, a gas turbine, etc., thus the brush sealing effect can be effectively improved, and the service life can be prolonged.

The invention provides a method for preparing an anti-uranium-tantalum-oxide film on the metal uranium surface, belongs to the technical field of material surface treatment, and particularly relates to a method for preparing an anti-uranium-tantalum-oxide film for protecting a metal uranium material surface, aiming at solving the problem that a metal uranium material has active chemical property,and is extremely easily oxidized, etched and failed in application. The method comprises the step of preparing an anti-uranium-tantalum-oxide film on the surface of a metal uranium film or metal uranium block from a uranium-tantalum alloy target which serves as a target by adopting direct-current magnetron sputtering; or preparing the anti-uranium-tantalum-oxide film on the surface of a metal uranium film or metal uranium block from a metal uranium target or metal tantalum target which serves as a target by adopting dual magnetron sputtering co-deposition method. The uranium-tantalum film hasexcellent antioxidation performance, has excellent interface bonding force and chemical compatibility with a uranium material. The method is mainly used for preparing an anti-uranium-tantalum-oxide film on the metal uranium surface.

The invention discloses a new type of cleaning powder, which is mainly used for cleaning glass, especially optical glass. Lotion 5-35%, chelating agent 5-35%. It not only solves the problem of poor versatility of the existing formula, but also makes the properties of the cleaning powder more stable, durable and better in effect.