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Large-size sapphire substrate multi-spectral hard antireflection film and preparation method thereof

A sapphire substrate and anti-reflection coating technology, which is applied in optics, optical components, ion implantation plating, etc., can solve problems such as failure of the sapphire window film layer, improve the optical performance and mechanical and physical properties of the film layer, and minimize the overall stress , Ease of transplantation

Active Publication Date: 2019-01-11
HUAZHONG PHOTOELECTRIC TECH INST (CHINA SHIPBUILDING IND CORP THE NO 717 INST)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to coat a multi-spectrum hard anti-reflection coating on a large-size sapphire substrate, and specifically solve the technical problem of failure of the large-size sapphire window film layer in harsh use environments

Method used

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  • Large-size sapphire substrate multi-spectral hard antireflection film and preparation method thereof
  • Large-size sapphire substrate multi-spectral hard antireflection film and preparation method thereof
  • Large-size sapphire substrate multi-spectral hard antireflection film and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0044] A hard anti-reflection coating for large-scale sapphire window visible light / laser / infrared three-band:

[0045] Size 350mm×310mm×7mm; technical requirements are as follows:

[0046] T avg ≥95%@470nm-800nm, AOI=0-150 (the same below);

[0047] T≥98.5%@1064nm±20nm;

[0048] T avg ≥95%@3.5um-4.4um, T avg ≥92%@3.5um-4.8um;

[0049] Uniformity of optical properties of large-area film formation: within ±2%;

[0050] The coating samples passed the high / low temperature, constant humidity and heat, salt spray, adhesion test and severe friction test specified in GJB2485-95 at one time, and the optical performance before and after the environmental test can still meet the requirements of optical technical indicators.

[0051] First of all, according to the above technical requirements, the optimal design of the film structure is carried out, and the results are as follows:

[0052] Sub|aM / bH / cL / dH / eL / fH / gL / hH / iL / jH / kL / lH / mL / nP / Air

[0053] Among them, M is the stress matc...

Embodiment 2

[0068] Oxide film layer stress test method and result

[0069] G.G.Stoney et al first carried out quantitative research on film stress, and formed the Stoney formula for calculating film stress. On this basis, other researchers have successively proposed calculation methods such as four-step phase shift method, ZYGO interferometer method, step meter method, Moiré fringe method and Newton ring method. Among them, the ZYGO interferometer method has the advantages of high measurement accuracy, simple and convenient operation, etc., and has been widely used in the study of thin film stress in recent years. The testing method of film stress in the present invention is the ZYGO interferometer method adopted. The Stoney formula for membrane stress is as follows:

[0070]

[0071] Among them, E s is the Young's modulus of elasticity of the substrate, υ s is the Poisson’s ratio of the substrate, t s is the substrate thickness, t f is the film thickness; R 0 and R are the curv...

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Abstract

The invention discloses a large-size sapphire substrate multi-spectral hard antireflection film and a preparation method thereof. The film comprises a sapphire substrate, a stress matching layer, an oxide material multilayer antireflection film system and a hard wear-resisting protective layer in sequence from bottom to top; the oxide material multilayer antireflection film system is formed by alternated plating of high / low refractive index materials, and ion beam assisted deposition is adopted. Ti3O5 or ZrO2 or Ta2O5 is selected as the high refractive index material, and SiO2 is selected as the low refractive index material. According to the invention, a conventional oxide film material is adopted, and the related technique is easy for transplanting, so that the film coating and film forming quality of the large-size sapphire substrate multi-spectral hard antireflection film does not depend on the hardware state of coating machine strongly, and the optical performance and the mechanical and physical performance of the film are substantially promoted.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and in particular relates to a large-scale sapphire-based multispectral hard anti-reflection film and a preparation method thereof. Background technique [0002] Sapphire optical materials are widely used in submarine optoelectronic masts, land-based optoelectronic countermeasure equipment, airborne optoelectronic pods, Military technical fields such as large-scale transport aircraft viewing windows and missile hoods have unique advantages in light weight, impact resistance and environmental adaptability of military equipment. In recent years, with the continuous development of military optoelectronic equipment towards the direction of large-angle and multi-directional detection integration, the application of large-size sapphire light windows (especially spatial multi-dimensional angle stereoscopic light windows) has gradually become prominent, especially for new The first-generation...

Claims

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Application Information

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IPC IPC(8): C23C14/08C23C14/10C23C14/22C23C14/24C23C14/02C23C14/58G02B1/115G02B1/14
CPCC23C14/022C23C14/024C23C14/081C23C14/083C23C14/10C23C14/221C23C14/24C23C14/5806G02B1/115G02B1/14
Inventor 姚细林王航杨放
Owner HUAZHONG PHOTOELECTRIC TECH INST (CHINA SHIPBUILDING IND CORP THE NO 717 INST)
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