Flexible stretchable optical waveguide sensing device and preparation method thereof
A technology for optical waveguides and devices, which is applied in the field of flexible and stretchable optical waveguide sensing devices and its preparation, can solve the problems of lack of detection, insufficient stretching performance of flexible optical waveguides, etc., and achieve convenient operation, high bendability, and manufacturing process simple effect
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[0036] Such as figure 1 As shown, a method for preparing a flexible and stretchable optical waveguide sensing device provided by an embodiment of the present invention includes the following steps:
[0037] S1 preparation of sacrificial layer
[0038] Utilize the spin-coating method to spin-coat PVA (polyvinyl alcohol) solution on the surface of the silicon wafer, and obtain a PVA film as the sacrificial layer 10 after curing;
[0039] S2 Preparation of silicon grating template
[0040] Prepare a silicon grating template 11 with a periodic structure on another silicon wafer by electron beam etching method or deep ultraviolet etching method;
[0041] S3 surface hydrophobic treatment
[0042] Perform hydrophobic treatment on the prepared silicon grating template to wrap a layer of hydrophobic layer 12 on the outer surface of the silicon grating template. Specifically, use a surface hydrophobic solution (such as hydrophobic silane) to perform hydrophobic treatment on the surfa...
Embodiment 1
[0057] S1 Perform hydrophobic treatment on the silicon wafer, dissolve the PVA powder in water to obtain a PVA solution, then spin-coat the PVA solution on the silicon wafer, put the silicon wafer spin-coated with the PVA solution in an oven, and proceed at 60°C 36 hours of curing treatment to obtain a cured PVA sacrificial layer with a thickness of 200 microns on the silicon wafer;
[0058] S2 Hydrophobic treatment is performed on the silicon wafer, and a silicon grating template with a periodic structure is prepared by etching with an electron beam etching method. The etching depth is 100nm, the width is 300nm, and the spacing is 300nm;
[0059] S3 soak the silicon grating template in 8% hydrophobic silane for 10 minutes, take it out and clean it with isopropanol to obtain a silicon template grating with surface hydrophobicity;
[0060] S4 Place two silicon grating templates that have been treated with surface hydrophobicity on the silicon wafer deposited with a sacrificial ...
Embodiment 2
[0064] S1 Perform hydrophobic treatment on the silicon wafer, dissolve the PVA powder in water to obtain a PVA solution, then spin-coat the PVA solution on the silicon wafer, put the silicon wafer spin-coated with the PVA solution in an oven, and proceed at 80°C 20 hours of curing treatment to obtain a cured PVA sacrificial layer with a thickness of 400 microns on the silicon wafer;
[0065] S2 Hydrophobic treatment is performed on the silicon wafer, and a silicon grating template with a periodic structure is prepared by etching with an electron beam etching method. The etching depth is 200nm, the width is 400nm, and the spacing is 400nm;
[0066] S3 soak the silicon grating template in 10% hydrophobic silane for 6 minutes, take it out and clean it with isopropanol to obtain a silicon template grating with surface hydrophobicity;
[0067] S4 Place two silicon grating templates that have been treated with surface hydrophobicity on the silicon wafer deposited with a sacrificial ...
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