System and method for removing metal chlorides by chloro-silicane raffinate quenching

A technology for chlorosilane residual liquid and chlorosilane clear liquid, which is applied in chemical instruments and methods, silicon compounds, halide silicon compounds, etc., can solve the problems of easy clogging of equipment, low recovery rate, difficult processing, etc., to avoid clogging, improve The effect of recovery rate and simple process

Pending Publication Date: 2019-01-18
CHINA ENFI ENGINEERING CORPORATION +1
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Problems solved by technology

[0004] The main disadvantage of the raffinate flash evaporation process is that metal chlorides adhere to the inner wall of equipment and pipelines, which are easy to block equipment and are very difficult to handle, which in turn leads to difficulty in recovery of chlorosilane raffinate and low recovery rate

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  • System and method for removing metal chlorides by chloro-silicane raffinate quenching
  • System and method for removing metal chlorides by chloro-silicane raffinate quenching
  • System and method for removing metal chlorides by chloro-silicane raffinate quenching

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Embodiment Construction

[0031] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0032] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, which are only for the convenience of describing the ...

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Abstract

The invention discloses a system and a method for removing metal chlorides by chloro-silicane raffinate quenching. The system comprises a static mixer, a gas-liquid separating tank and a filter, wherein the static mixer is provided with a chloro-silicane raffinate inlet, a liquid nitrogen inlet and a metal-containing chloride suspended solid as well as a nitrogen gas raffinate outlet; a gas-phasespace and a liquid-phase space are formed in the gas-liquid separating tank from top to bottom; a liquid inlet and a solution outlet for the metal-containing chloride suspended solid are arranged in the liquid-phase space; the liquid inlet is connected with the raffinate outlet for the metal-containing chloride suspended solid and the nitrogen gas; a liquid level meter is arranged in the liquid-phase space; a nitrogen gas outlet is arranged in the gas-phase space; the filter is provided with a solution inlet for the metal-containing chloride suspended solid, a metal chloride outlet, a chloro-silicane clear liquor outlet and a filter element; and the solution inlet for the metal-containing chloride suspended solid is connected with the solution outlet for the metal-containing chloride suspended solid.

Description

technical field [0001] The invention belongs to the field of polysilicon production, in particular, the invention relates to a system and a method for rapidly cooling chlorosilane raffinate to remove metal chlorides. Background technique [0002] The Siemens process for polysilicon production is based on the principle of reducing high-purity trichlorosilane with high-purity hydrogen on a high-purity silicon core at a temperature of about 1100 ° C to generate polysilicon and deposit it on the silicon core. The improved Siemens process is based on the traditional Siemens process, and it also has energy saving, consumption reduction, and recycling of a large amount of H produced during the production process. 2 , HCl, SiCl 4 And other by-products and a supporting process for a large amount of by-product heat. In the process of producing polysilicon by the improved Siemens method, a large amount of by-product silicon tetrachloride will be produced. At present, more than 90% o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCC01B33/10778
Inventor 万烨曾晓国严大洲张升学张伟
Owner CHINA ENFI ENGINEERING CORPORATION
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