Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same

A technology for glass substrates and photomasks, which is applied to the removal of originals, optics, and solid waste for photomechanical processing, and can solve problems such as traces, existing patterns, and easy pattern defects, so as to reduce regeneration costs and regenerate Ease of handling and reduction of manufacturing costs

Active Publication Date: 2019-02-01
DAI NIPPON PRINTING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] However, the used photomask substrate or the substrate on which the metal thin film pattern has been formed in the photomask process has the following problem: when the metal thin film pattern is only dissolved and removed with an etchant and washed, if the metal thin film is formed again and the If the substrate is patterned by photolithography, there will be traces of the original pattern, and pattern defects will easily occur.

Method used

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  • Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same
  • Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same
  • Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0226] Hereinafter, in the examples of the present invention, a photomask of synthetic quartz glass with a size of 450 mm×550 mm and a thickness of 5 mm for a liquid crystal panel was used for regeneration treatment.

[0227] The chrome film was completely removed with a chrome etchant about the said used photomask, and it wash|cleaned with pure water was made into the glass blank state. Exhalation image examination was performed in this state, and as a result, traces of the original pattern that were removed were confirmed.

[0228] Next, the regenerated substrate from which the chromium film was removed was immersed in a 5% KOH aqueous solution at a liquid temperature of 25° C. for 4 hours, and washed with pure water. The amount of glass etching was 0.6 μm, and a breath image inspection was performed on the washed substrate. As a result, a glass substrate for a photomask in which the original pattern disappeared and the pattern could not be confirmed by visual inspection was...

Embodiment 2

[0233] The reproduction process of the photomask produced by the same method as Example 1 was performed.

[0234] After the photomask is used, it is regenerated in order to reuse it as a photomask blank.

[0235] The chrome film was completely removed with a chrome etchant for the above used photomask, and washed with pure water to be in a glass blank state. Exhalation image examination was performed in this state, and as a result, traces of the original pattern that were removed were confirmed.

[0236] Next, the regenerated substrate from which the chromium film was removed was immersed in a 10% KOH aqueous solution at a liquid temperature of 25° C. for 4 hours, and washed with pure water. The glass etching amount was 1.5 μm, and a breath image inspection was performed on the washed substrate. As a result, a glass substrate for a photomask in which the original pattern disappeared and the pattern could not be confirmed by visual inspection was obtained.

[0237] Next, a ch...

Embodiment 3

[0240] The reproduction process of the photomask produced by the same method as Example 1 was performed.

[0241] After the photomask is used, it is regenerated in order to reuse it as a photomask blank.

[0242] The chrome film was completely removed with a chrome etchant for the above used photomask, and washed with pure water to be in a glass blank state. Exhalation image examination was performed in this state, and as a result, traces of the original pattern that were removed were confirmed.

[0243] Next, the regenerated substrate from which the chromium film was removed was immersed in solution 3 at a liquid temperature of 25° C. for 4 hours, and washed with pure water. The amount of glass etching was 1 μm or less, and a breath image inspection was performed on the washed substrate, and as a result, a glass substrate for a photomask in which the original pattern disappeared and the pattern could not be confirmed by visual inspection was obtained.

[0244] Next, a chrom...

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Abstract

The present invention relates to a reprocessing method for remaking as a new photo mask glass substrate either a photo mask which is used up in each type of flat panel manufacturing or a photo mask which is rendered defective in a photo mask fabrication process, as well as a photo mask glass substrate which is remade in this reprocessing method, and a blank mask and photo mask used therein. The method allows obtaining a remade glass substrate with few defects and at low cost, by a process which makes wettability uniform such that traces of an original pattern do not appear in breath figure inspection, without carrying out a conventional physical polishing process upon the surface of the remade glass substrate.

Description

[0001] This application is a divisional case of an invention patent application with an international filing date of September 19, 2013, an application number of 201380047359.8, and an invention title of "Glass regeneration treatment method, recycled glass substrate, and photomask blank and photomask using the same" Apply. technical field [0002] The present invention relates to the use of a photomask that is patterned with a metal thin film and used in the photolithography (hereinafter also referred to as photolithography) process of various flat plates or a photomask that becomes defective in the photomask manufacturing process as Novel method of reusing and regenerating glass substrate for photomask, glass substrate for photomask regenerated by the method of regenerating, and blank for photomask and photomask using the glass substrate for photomask . Background technique [0003] Photomasks generally used to manufacture flat panels are made by laminating metal thin film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/60B09B5/00C03C15/00
CPCB09B5/00G03F1/60G03F1/72G03F1/68C03C15/00C03C2218/33C03C17/22
Inventor 木下一树二岛悟青木阳祐板仓敬二郎
Owner DAI NIPPON PRINTING CO LTD
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