Phase change memory and preparation method thereof
A phase-change memory and phase-change technology, applied in the direction of electric solid devices, semiconductor devices, electrical components, etc., can solve the problems affecting the electrical performance and contact resistance of two-dimensional crystal diodes, and achieve the improvement of electrical performance, storage density, series connection. The effect of low resistance
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[0031] In order to make the purpose, technical solution and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0032] Please refer to the attached Figure 1-6 , the method for preparing phase change memory according to the present invention, specifically comprises the following steps:
[0033] S01: Please refer to the attached figure 1 A doped layer 102 is formed on the surface of the substrate 101 by ion implantation. Specifically, a conventional P-type Si substrate 101 may be used, and an N-type heavily doped layer 102 is formed on the surface of the P-type Si substrate 101 by ion implantation. In this embodiment, the injection element may be As.
[0034] S02: Please refer to the attached figure 2 A groove 103 is formed in the doped layer and the substrate by photolithography, and the depth of the groove is greater than the de...
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