Process for manufacturing solar cell by twice screen printing and grooving

A technology of solar cells and screen printing, applied in the direction of sustainable manufacturing/processing, final product manufacturing, circuits, etc., can solve the problems of unsuitability for industrialization and increased production costs, to increase the conductive cross-sectional area and reduce the grid line The effect that the efficiency of resistance and photoelectric conversion is high

Active Publication Date: 2011-02-09
TRINA SOLAR CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the electrode process is generally completed by electroplating, and the production cost is greatly increased. It is not suitable for industrialization and can only be used for the research and development of high-efficiency batteries.

Method used

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  • Process for manufacturing solar cell by twice screen printing and grooving
  • Process for manufacturing solar cell by twice screen printing and grooving

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Embodiment Construction

[0024] A solar cell manufacturing process combining two-time screen printing and grooving for manufacturing such as figure 1 A solar cell with twice printed electrodes is shown. The solar cell has a silicon wafer, and the silicon wafer adopts a P-type substrate 6. The surface of the silicon wafer is divided into an electrode grid line area and an electrode non-grid line area. The solar cell manufacturing process has the following step:

[0025] i) removing the damaged surface layer of the silicon wafer and texturizing the surface of the silicon wafer;

[0026] ii) Oxide mask layer process: grow an oxide mask layer under TCA conditions;

[0027] iii) Grooving process: laser grooves are made in the electrode grid line area of ​​the front electrode on the surface of the silicon wafer, so that the electrode grid line area of ​​​​the front electrode forms an etching groove, and the oxide mask layer above the etching groove is removed;

[0028] iv) cleaning process: NaOH cleaning,...

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PUM

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Abstract

The invention discloses a process for manufacturing a solar cell by twice screen printing and grooving, which is used for manufacturing the solar cell by twice electrode printing and comprises a grooving process and a twice printing process, wherein the grooving process comprises the step of performing grooving on an electrode grid line area on the surface of a silicon wafer so as to form an etched groove in the electrode grid line area; and the twice printing process comprises the following steps of: a, primary electrode printing, namely, filling printing electrode paste into the etched groove and performing drying to form a first layer of electrode in the etched groove; and b, secondary electrode printing, namely, printing the electrode on the outer surface of the first layer of electrode so as to form a second layer of electrode in the electrode grid line area on the surface of the silicon wafer. The solar cell manufactured by the method has relatively lower series resistance, a selective emitter and relatively higher conversion efficiency, and can reduce shading loss; and the electrode paste is difficult to spread in a sintering process.

Description

technical field [0001] The invention relates to a manufacturing process of a crystalline silicon solar cell, in particular to a manufacturing process of a solar cell combining two times of screen printing and grooving. Background technique [0002] Screen printing technology is a commonly used electrode manufacturing process in the manufacturing process of industrialized crystalline silicon solar cells. The specific steps of the existing manufacturing process of crystalline silicon solar cells using screen printing are as follows. The conventional printing method is one-time: a) silicon wafer Removal of surface damage layer and texture of silicon chip surface; b) phosphorus oxychloride (POCL 3 ) Diffusion of liquid source N+; c) Hydrogen fluoride (HF) dephosphorous silicon glass (PSG) and edge etching; d) Thermal growth of high-quality silicon oxide; e) Surface deposition of anti-reflective SiNx; field; g) printing front silver electrodes; h) electrode electric field metall...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 盛健
Owner TRINA SOLAR CO LTD
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