25 results about "Solar cell fabrication" patented technology

This utility model discloses a silicon substrate, a solar cell, and a photovoltaic module, relating to the field of solar cell technology, to solve the problem that after initial silicon wafers are treated with laser thermal cracking, excessive edge stress leads to a high breakage rate and significant performance degradation during subsequent solar cell fabrication. The silicon substrate includes a first surface and a second surface opposite to each other, and a plurality of side surfaces connecting the first and second surfaces; the side surfaces include a first side surface, wherein at least a portion of the first side surface has a first protrusion, one end of the first protrusion being close to the first surface, and the other end of the first protrusion being close to the second surface; along the direction from the first surface to the second surface, the distance between any point on the first protrusion and the first side surface first increases and then decreases.

This application provides a method for fabricating a solar cell and a solar cell. The method includes: forming a composite sacrificial layer on the surface of a solar cell substrate; forming an ink mask on the side of the composite sacrificial layer facing away from the solar cell substrate, the ink mask comprising microcapsules, each microcapsule comprising a wall and a core, the wall material comprising polylactic acid-glycolic acid copolymer, and the core material comprising sodium bicarbonate; patterning the ink mask and composite sacrificial layer using a laser processing technique to form a target pattern matching grid lines, thereby exposing a portion of the solar cell substrate; the composite sacrificial layer serving to buffer stress generated by the laser and absorb laser light during subsequent fabrication; forming grid lines on the exposed solar cell substrate; and removing the ink mask and composite sacrificial layer. This application solves the problem of poor quality solar cells obtained by existing solar cell fabrication methods.

The invention, which relates to a liquid-carrying roller for wet etching and a wet etching method, belongs to the technical field of solar cell manufacturing, and solves the problem of abnormal roller levelness in a process of manufacturing a solar cell in the prior art. The liquid-carrying roller for wet etching of the invention comprises a first end shaft, a second end shaft, and a liquid-carrying shaft, the first end shaft and the second end shaft being located at both ends of the liquid-carrying shaft, respectively, the first end shaft, the second end shaft and the liquid-carrying shaft being arranged concentrically, and the diameters of the first end shaft and the second end shaft being both adjustable.

The present invention provides a method for manufacturing a solar cell, comprising: a step of first patterning the periphery of one surface of a substrate so as to form a groove; a step of forming a thin film layer on one surface or the other surface of the substrate; and a step of cutting the periphery of the substrate along the groove.

The application relates to a deposition device, a deposition system and a solar cell manufacturing production line. The deposition device comprises a deposition main body with a gas inlet, a reaction chamber and a gas outlet connected in sequence; and a heat exchange assembly located in the reaction chamber. The heat exchange assembly comprises at least one heat exchange plate. All the heat exchange plates are arranged close to the gas outlet. The projection of the area defined by the outer contour of the heat exchange plate in the direction of the central axis of the gas outlet covers at least part of the gas outlet. The heat exchange plate has multiple groups of gas passing holes arranged in sequence along the direction of the central axis pointing to the outer edge. In the two adjacent groups of gas passing holes, the outer group of gas passing holes is arranged around the outer periphery of the inner group of gas passing holes. Each group of gas passing holes comprises a plurality of gas passing holes arranged along the circumferential direction. The deposition device, the deposition system and the solar cell manufacturing production line can reduce the defective rate of the battery piece.

The application relates to a printing system and a solar cell manufacturing production line. The printing system has a first shooting station, a second shooting station and a printing station. The printing system comprises a position acquisition device, a transfer device and a printing device. The position acquisition device is used for shooting the position of a printing pattern on a screen plate located at the first shooting station. The transfer device is used for transferring a cell between the second shooting station and the printing station. The printing device is used for shooting the position of the cell located at the second shooting station. The printing device is used for driving the screen plate installed thereon to move according to the position of the printing pattern on the first shooting station and the position of the cell at the second shooting station, so that the printing pattern of the screen plate installed thereon is aligned with the cell located at the printing station. The printing system and the solar cell manufacturing production line provided by the application can improve the production capacity of the production line.

This invention provides a double-layer interface-free light-trapping coating and its preparation method, as well as a battery module and manufacturing method, relating to the field of solar cell manufacturing technology. The method includes: printing a substrate layer; pre-curing; printing a structural layer; and main curing. In the prepared double-layer interface-free light-trapping coating, the substrate layer is printed using UV ink with a predetermined refractive index, providing optical anti-reflection and anti-reflection properties. The structural layer has a three-dimensional structure, providing excellent light-trapping effects. Simultaneously, the structural layer is also printed using UV ink with the same refractive index as the substrate layer, and the substrate layer and structural layer have an integrated, interface-free structure, effectively combining the anti-reflection and anti-reflection properties of the substrate layer with the light-trapping properties of the structural layer, achieving a dual effect of "anti-reflection" and "light-trapping." This effectively improves the power output of solar cell modules and has advantages such as high precision, stable structure, simple preparation process, short process, and low equipment investment.

This invention provides a method for manufacturing a perovskite solar cell having a photoelectric conversion layer that does not have pinholes. [Solution] A method for manufacturing a solar cell having a photoelectric conversion layer containing a perovskite compound comprises, in this order, applying a precursor solution of the perovskite compound to a coating surface to form a coating, blowing an inert gas with a flow rate of 40 m / s or more perpendicularly onto the coating which is heated to 35°C to 45°C, and drying the coating by heating to form the photoelectric conversion layer.

The application discloses a silicon wafer pyramid suede modification method and a solar cell, and belongs to the technical field of solar cell manufacturing. The silicon wafer pyramid suede modification method comprises the following steps: pretreatment; first step of texturing: the silicon wafer is placed in an alkali solution containing additive A, and a basic pyramid suede is formed through reaction; water washing; second step of modification: the silicon wafer is placed in an alkali solution containing additive B, and a tower body step structure and a nano pit are formed through reaction; post-treatment; the additive A and the additive B are different chemical system heterologous additives; and the temperature of the first step of texturing is higher than the temperature of the second step of modification. The application first constructs a high-density basic pyramid suede, then performs directional etching on the tower body, and simultaneously forms a step-shaped laminated surface and a surface nano pit array, so that the comprehensive performance of the solar cell is improved.

This invention provides a perovskite solar cell, its fabrication method, and a three-terminal tandem solar cell, specifically relating to the field of solar cell fabrication technology. The fabrication method for this perovskite solar cell involves first preparing a first transport layer on a silicon substrate. Using atomic layer deposition (ALD) technology, a perovskite thin film is formed on the surface of the first transport layer, followed by in-situ annealing to obtain a perovskite absorber layer. Then, a second transport layer, a buffer layer, and a transparent conductive layer are sequentially fabricated on the surface of the perovskite absorber layer to obtain the perovskite solar cell. ALD's self-limiting reaction is insensitive to silicon textured surfaces, overcoming the bottleneck of uneven film formation in traditional processes. This results in a perovskite layer with precise thickness, dense density without pinholes, and consistent grain orientation, significantly suppressing interface / bulk recombination and improving carrier lifetime. In-situ annealing avoids thermal damage and promotes hydrogen passivation of the silicon surface, synergistically improving Voc and FF.

This disclosure belongs to the field of crystalline silicon solar cell fabrication technology, specifically relating to a method for improving light-induced degradation of crystalline silicon solar cell modules and a crystalline silicon solar cell module itself. This disclosure provides a method for improving light-induced degradation of crystalline silicon solar cell modules, comprising introducing NH3 and using a radio frequency power of 7000~12000W and a pulse switching ratio of 1:(15~40) for NH3 ionization treatment after the first layer of coating is completed and before the second layer of coating is completed; the ionized film is then annealed; wherein the first layer of coating includes depositing an aluminum oxide layer on a silicon wafer substrate, and the second layer of coating includes depositing a silicon nitride layer. Hydrogen atoms are generated by ionizing NH3 and spread evenly on the surface of the aluminum oxide layer. Annealing allows the hydrogen atoms to penetrate into the interior of the aluminum oxide layer, repairing defects formed during the aluminum oxide deposition process and defects at the aluminum oxide-silicon interface, effectively improving the passivation effect of the aluminum oxide layer, thereby improving the photoelectric conversion efficiency of the cell and mitigating light-induced degradation.

This invention belongs to the field of solar cell manufacturing technology and relates to a method for producing an emitter and back-side passivated solar cell. The method involves texturing a silicon wafer to form a pyramidal textured surface, improving light capture efficiency and thus increasing the photoelectric conversion efficiency of the cell; diffusing and doping N-type impurities onto the front side of the texturized silicon wafer; etching the back side and edges of the diffused-doped silicon wafer to remove excess material and improve cell efficiency; depositing a silicon nitride film on the front and back sides of the etched silicon wafer, and depositing an aluminum oxide film on the silicon nitride film on the back side; creating rectangular grooves on the back side of the silicon wafer; printing sub-grid lines and main grid lines on the silicon wafer; and sintering the printed silicon wafer at high temperature to obtain the emitter and back-side passivated solar cell. This invention's method for producing emitter and back-side passivated solar cells has a relatively simple manufacturing process and high cell efficiency.

This application discloses a conductive paste, a conductive electrode, a preparation method thereof, and a crystalline silicon solar cell. The conductive paste, by weight, comprises the following components: silver powder: 40-78 wt%; nickel powder: 10-40 wt%; glass powder: 2-6 wt%; organic carrier: 8-15 wt%. The glass powder, by molar amount, comprises the following components: PbO: 33-59 mol%; WO3: 2.5-12.5 mol%; B2O3: 1-27 mol%. This application, through optimization of the glass powder formulation, effectively reduces the oxidation of metallic nickel during high-temperature sintering, thereby ensuring that the silver-nickel conductive paste containing nickel powder achieves ideal conductivity. This makes it possible to produce silver-nickel conductive pastes with higher nickel content, effectively expanding the application scenarios of silver-nickel conductive pastes in the field of crystalline silicon solar cell fabrication.

A method of manufacturing an interdigitated back contact solar cell is provided The method comprises: providing a substrate having a back surface; arranging a plurality of first semiconductor elements on the back surface of the substrate, the first semiconductor elements having a back surface; treating the back surface of each first semiconductor element to provide each first semiconductor element with a textured back surface; and subsequently, arranging a plurality of second semiconductor elements on the back surface of the substrate, the plurality of second semiconductor elements interdigitated with the plurality of first semiconductor elements. The step of arranging the plurality of second semiconductor elements comprises: depositing a semiconductor layer onto the back surface of the substrate and the first semiconductor elements, said semiconductor layer comprising: second semiconductor elements interdigitated with the first semiconductor elements; and a plurality of waste portions deposited onto respective textured back surfaces of the first semiconductor elements; and separating the waste portions from the respective first semiconductor elements along the respective textured back surface.

The application relates to a wet preparation device and a solar cell manufacturing production line. The wet preparation device comprises a preparation main body, a plurality of liquid medicine storage containers, a hot water storage container, a plurality of first pipeline assemblies and a second pipeline assembly; the preparation main body is provided with a preparation groove; the liquid medicine storage container is provided with a liquid medicine storage cavity; the hot water storage container is provided with a hot water storage cavity; the first pipeline assembly corresponds to the liquid medicine storage container one by one; the first pipeline assembly is used for guiding the fluid in the corresponding liquid medicine storage cavity to flow into the preparation groove; and the second pipeline assembly is used for guiding the hot water in the hot water storage cavity to flow into each liquid medicine storage cavity to clean each liquid medicine storage cavity. The wet preparation device and the solar cell manufacturing production line provided by the application can improve the production capacity.

This application provides a method for cutting a solar cell and a half-cell solar cell. The solar cell includes a first surface and a second surface opposite to each other. A first cutting line is located on the first surface, and a second cutting line is located on the second surface. The projection of the first cutting line on the second surface overlaps with the second cutting line. The method includes: preheating the location of the first cutting line; performing laser scanning on the location of the first cutting line on the preheated solar cell; and using a cooling process to cool the location of the second cutting line on the scanned solar cell, causing the cooled solar cell to crack, thus obtaining a half-cell solar cell. This application solves the problem that in the existing laser scribing technology, thermal damage to the silicon wafer surface and cross-section caused by laser action during the half-cell solar cell fabrication process severely affects the carrier transport efficiency, thereby affecting the overall performance of the solar cell.

The utility model discloses a kind of back contact solar cells, it is related to solar cell manufacturing technical field, comprising: silicon base, silicon base first main surface is provided with first area, second area and interval area, interval area is between first area and second area;From inside to outside layering is provided with first carrier collection layer, modification layer and second doped layer in first area;First carrier collection layer and modification layer extend to interval area respectively;The doping type of first carrier collection layer and modification layer is same, and the doping type of second doped layer is opposite;Second carrier collection layer is provided with in second area;Second carrier collection layer extends to interval area and covers first carrier collection layer, and second carrier collection layer includes second doped layer in it. The implementation is by setting modification layer, avoid the damage of secondary laser technology to first carrier collection layer, improve the performance of the back contact solar cell.

The application belongs to the technical field of semiconductor material processing and solar cell manufacturing, and discloses a single crystal silicon wafer cleaning agent and a method for cleaning a single crystal silicon wafer by using the same. The single crystal silicon wafer cleaning agent comprises choline, an organic acid, a non-ionic surfactant and benzotriazole; the mass ratio of choline to the organic acid is (1.0-2.5):1; and the non-ionic surfactant is an alkyl phenol polyoxyethylene ether non-ionic surfactant. The cleaning agent can effectively remove organic contaminants, metal impurity contaminants and damage layers on the surface of a silicon wafer, so that a silicon wafer with a clean surface, uniform color, no pyramid suede structure, smooth linear edge, and no new cracks or edge collapse is obtained; and the cleaning agent can avoid the introduction of high-risk strong acid and alkali metal pollution, and improve the quality of the silicon wafer. The cleaning process is easy to control, the process window is wide, the requirement for equipment is low, the operation cost and the operation complexity are reduced by using the cleaning agent to clean the single crystal silicon wafer.

This invention belongs to the field of thin-film solar cell fabrication technology, and discloses a laser scribing and transfer device and its method for processing thin-film solar cells. The device includes a laser, a processing head, a processing platform, and a motion control mechanism. The processing head includes a beam splitting mechanism, a laser scribing output port, a laser transfer output port, and a transfer mechanism. This invention integrates laser scribing and transfer into one device, and the laser scribing output port and the laser transfer output port are aligned in the movement direction of the processing head. During processing, the scribing and transfer paths completely overlap, thereby completing the printing of insulating material for the groove simultaneously with the scribing process, without increasing the dead zone width of the module. The process is simple, with high filling accuracy and low equipment cost. This invention uses laser transfer to cover insulating material on the groove, which is less expensive than dispensing equipment and requires less photoresist and other insulating adhesives.

The present application discloses a solar cell dispensing apparatus and solar cell manufacturing device, belongs to the solar cell field. A solar cell dispensing apparatus for use in a solar cell manufacturing device, and comprises a dispensing control unit, a dispensing execution unit, a CCD positioning camera, and a UV curing lamp; the CCD positioning camera, the dispensing execution unit, and the UV curing lamp are all arranged above a cell conveyor belt, and are sequentially arranged along a conveying direction of a solar cell; the CCD positioning camera and the dispensing execution unit are both connected to the dispensing control unit, and the dispensing control unit is configured to receive images acquired by the CCD positioning camera and to control the dispensing execution unit to execute a dispensing operation.

The utility model relates to a solar cell manufacturing production line. The solar cell manufacturing production line comprises a main sintering device, a conveying device, a laser-assisted sintering device and an air blowing device, the main sintering device, the conveying device and the laser-assisted sintering device are sequentially arranged in the first horizontal direction, and the main sintering device is used for sintering printed cell pieces; the conveying device is used for conveying the sintered battery piece to the laser-assisted sintering device, and the blowing device is arranged between the main sintering device and the laser-assisted sintering device and used for blowing air towards the front face of the battery piece on the conveying device so as to blow off foreign matter on the battery piece. The solar cell manufacturing production line provided by the utility model can improve the laser-assisted sintering effect of the cells.

This invention provides a method for preparing a P-type polycrystalline silicon layer, a method for preparing a TBC (Transient Carbon Fiber) cell, and a TBC cell, specifically relating to the field of solar cell fabrication technology. The method for preparing the P-type polycrystalline silicon layer involves first preparing a polycrystalline silicon-amorphous silicon stack on an N-type crystalline silicon substrate with a first tunneling oxide layer on the back side, followed by boron diffusion to obtain a P-type polycrystalline silicon layer and a BSG (Bipolar Solid State Geographic Array) layer. The polycrystalline silicon-amorphous silicon stack includes a first polycrystalline silicon layer, a second polycrystalline silicon layer, a third polycrystalline silicon layer, and an amorphous silicon layer arranged sequentially. The polycrystalline silicon-amorphous silicon stack is prepared using a stepped cooling and boosting LPCVD (Liquid Crystallization-Voltage Continuous Chemical Deposition) process. This structure effectively alleviates the accumulation of interfacial thermal stress caused by thermal expansion mismatch, suppresses wafer warping and localized bonding during post-reaction cooling, significantly reduces the risk of mechanical scratches and fragmentation caused by inter-wafer contact in subsequent material feeding and wafer separation processes, and improves the process consistency and production line yield of the P-type polycrystalline silicon layer structure.

This invention relates to the field of photovoltaic technology, specifically to a solar cell and its fabrication method, comprising: coating a seed layer with photosensitive adhesive to form a photosensitive adhesive layer; forming pre-plated grooves on the photosensitive adhesive layer by printing and developing; coating the edge of the cell substrate with a first edge-sealing adhesive, the first edge-sealing adhesive being alkali-resistant; coating the side of the first edge-sealing adhesive away from the cell substrate with a second edge-sealing adhesive; electroplating grid lines within the pre-plated grooves; removing the photosensitive adhesive layer and the second edge-sealing adhesive remaining on the copper seed layer with an alkaline solution; and removing the copper seed layer and the first edge-sealing adhesive from the non-grid line areas. This solar cell fabrication method can improve the problem of increased carrier recombination, increase the open-circuit voltage, and increase the fill factor (FF), thereby ensuring that the fabricated solar cell has high conversion efficiency.

This application relates to the field of solar cell fabrication technology, specifically disclosing an optically matched and sputter-damage-resistant tandem solar cell and its fabrication method. This optically matched and sputter-damage-resistant tandem solar cell includes a wide bandgap top cell, an intermediate connecting structure, and a narrow bandgap bottom cell stacked sequentially from the light-receiving side to the back-lighting side. The intermediate connecting structure includes a light-coupled buffer layer, a dense protective layer, and a transparent conductive tunneling layer stacked sequentially from the wide bandgap top cell side to the narrow bandgap bottom cell side. The light-coupled buffer layer is a composite material of an organic matrix doped with high-refractive-index nanoparticles. This application employs a three-layer intermediate connecting structure consisting of a light-coupled buffer layer, a dense protective layer, and a transparent conductive tunneling layer. By adjusting the refractive index of the light-coupled buffer layer to the range of 1.8-2.2 and ensuring that the absolute value of the refractive index difference between the buffer layer and the top cell's light-absorbing layer is ≤0.3, the open-circuit voltage and short-circuit current density of the tandem solar cell are improved.

The application discloses a silicon substrate processing method, a solar cell and a manufacturing method thereof, and relates to the technical field of photovoltaics, so as to remove impurities and dirt carried on the surface of the silicon substrate. The silicon substrate processing method comprises the following steps: providing a silicon substrate, the silicon substrate having opposite first and second surfaces; the first surface having a first oxide layer, a wrap-around tunneling layer and a wrap-around amorphous silicon layer generated by wrap-around plating in a laminated manner; removing the wrap-around amorphous silicon layer of the silicon substrate by using a first wet removal process; keeping the silicon substrate with the removed wrap-around amorphous silicon layer in a wet state at all times, and removing the first oxide layer and the wrap-around tunneling layer by using a second wet removal process. The silicon substrate processing method, the solar cell and the manufacturing method thereof are used for solar cell manufacturing.