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A surface-enhanced Raman substrate and its preparation method

A surface-enhanced Raman and substrate technology, applied in Raman scattering, instrumentation, vacuum evaporation coating, etc., can solve the problem that the resolution of laser thermal processing needs to be improved, and achieve the effect of simple method, small size and short process

Active Publication Date: 2021-11-02
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the problem with this solution is that the resolution of laser thermal processing needs to be improved.

Method used

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  • A surface-enhanced Raman substrate and its preparation method
  • A surface-enhanced Raman substrate and its preparation method
  • A surface-enhanced Raman substrate and its preparation method

Examples

Experimental program
Comparison scheme
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Embodiment 1

[0072] In this embodiment, a surface-enhanced Raman substrate is prepared according to the following method:

[0073] (1) Depositing indium with a power magnetron sputtering of 40W on a glass substrate to obtain an indium nanofilm, the thickness of the indium nanofilm is 15nm;

[0074] (2) performing raster-scanning laser beam irradiation on the indium nanofilm described in step (1), to obtain an indium nanofilm containing nanopores;

[0075] Wherein, the power of the laser beam irradiation is 100mW, the laser pulse width is 1000ns, and the laser wavelength is 405nm;

[0076] (3) Depositing a silver nanofilm with a thickness of 10 nm by magnetron sputtering with a power of 40 W on the indium nanofilm containing nanopores described in step (2), to obtain the surface-enhanced Raman substrate.

[0077] The surface-enhanced Raman substrate prepared in this embodiment includes an indium nanofilm containing nanopores and a silver nanofilm deposited on the surface of the indium nano...

Embodiment 2

[0086] In this embodiment, a surface-enhanced Raman substrate is prepared according to the following method:

[0087] (1) Deposit indium on a glass substrate by magnetron sputtering with a power of 40W to obtain an indium nanofilm, and the thickness of the indium nanofilm is 10nm;

[0088] (2) performing raster-scanning laser beam irradiation on the indium nanofilm described in step (1), to obtain an indium nanofilm containing nanopores;

[0089] Wherein, the power of the laser beam irradiation is 50mW, the laser pulse width is 500ns, and the laser wavelength is 405nm;

[0090](3) Depositing an aluminum nanofilm with a thickness of 10 nm by magnetron sputtering with a power of 60 W on the indium nanofilm containing nanopores described in step (2), to obtain the surface-enhanced Raman substrate.

[0091] The surface-enhanced Raman substrate prepared in this embodiment includes an indium nanofilm containing nanopores and an aluminum nanofilm deposited on the surface of the indi...

Embodiment 3

[0094] In this embodiment, a surface-enhanced Raman substrate is prepared according to the following method:

[0095] (1) Depositing indium with a power magnetron sputtering of 60W on a quartz substrate to obtain an indium nanofilm, the thickness of the indium nanofilm is 25nm;

[0096] (2) performing raster-scanning laser beam irradiation on the indium nanofilm described in step (1), to obtain an indium nanofilm containing nanopores;

[0097] Wherein, the power of the laser beam irradiation is 150mW, the laser pulse width is 2000ns, and the laser wavelength is 405nm;

[0098] (3) A gold nanofilm with a thickness of 15 nm is deposited on the indium nanofilm containing nanopores with a power of 60 W by magnetron sputtering in step (2), to obtain the surface-enhanced Raman substrate.

[0099] The surface-enhanced Raman substrate prepared in this example includes an indium nanofilm containing nanopores and a gold nanofilm deposited on the surface of the indium nanofilm containin...

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Abstract

The invention discloses a surface-enhanced Raman substrate and a preparation method thereof. The surface-enhanced Raman substrate includes a first metal nanofilm containing nanopores and a second metal nanofilm deposited on its surface. The preparation method comprises (1) depositing a first metal nano film on a substrate, the thickness of the first metal nano film is below 25nm; Obtaining the first metal nanofilm containing nanopores; (3) depositing a second metal on the first metal nanofilm containing nanopores in step (2), to obtain the surface-enhanced Raman substrate. The sensitivity of the surface-enhanced Raman substrate provided by the present invention is extremely high, and the R6g molecular sensitivity analysis is performed on it, and the detection limit can reach 10 ‑15 mol / L. The preparation method provided by the invention utilizes laser direct writing to prepare the nanopore structure, and the method is simple, the process is short, and the product sensitivity is high.

Description

technical field [0001] The invention belongs to the technical field of surface-enhanced Raman substrate processing, and relates to a surface-enhanced Raman substrate and a preparation method thereof. Background technique [0002] Surface-enhanced Raman (SERS) substrates have great application prospects in the field of single-molecule recognition and detection. The detection objects cover pesticides, toxic gases, explosives, drugs and pathogenic biomolecules. The preparation method of SERS substrate is generally to prepare structures such as nano-slits and nano-holes on the surface of noble metals. Practical high-quality SERS substrates (chips) require high sensitivity, high consistency, and low cost, which poses challenges to current processing methods. For example, the top-down lithography technology (such as EBL and FIB) has the problems of long time-consuming and high cost for large-area processing; the consistency of SERS prepared by chemically assembling nanocrystals i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65C23C14/35C23C14/18
CPCC23C14/185C23C14/35G01N21/658
Inventor 王晓丰王雷刘前
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA