Light splitter light splitting-based SP simulation lighting super-resolution photoetching lens and device

A technology for exciting illumination and spectroscope, applied in the field of super-resolution lithography, can solve the problem that the lithography device cannot meet the needs of super-resolution lithography, and achieve the effect of convenient exchange
CN109613801AInactive Publication Date: 2019-04-12INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
3 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Publication Date
2019-04-12
Estimated Expiration
Not applicable Β· inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses a light splitter light splitting-based SP simulation lighting super-resolution photoetching lens and device, and belongs to the technical field of improvement and innovation ofa super-resolution photoetching lens and device. The device comprises an air purification system, a light source, a light splitter light splitting system, a mask bearing module and a workbench, wherein the air purification system is used for protecting a photoetching device, the light source is used for generating i-line ultraviolet exposure beam, the light splitter light splitting system is usedfor simulating lighting, the mask bearing module is used for bearing a surface plasma imaging device, the workbench is used for bearing a substrate, and the light splitter light splitting system andthe mask bearing module form the SP simulation lighting super-resolution photoetching lens. The device employs a mode of light splitter light splitting, the surface plasma simulation lighting is achieved on the premise of no damage to light field uniformity of the light source, the near-field working distance is improved, the imaging contrast ratio is improved, and super-resolution photoetching isachieved.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention belongs to the technical field of super-resolution lithography, and in particular relates to a spectroscopic-based SP excitation illumination super-resolution lithography lens and device. Background technique

[0002] As the size of VLSI continues to shrink, the resolution requirements for lithography devices are getting higher and higher, and traditional lithography devices are completely unable to meet the needs of super-resolution lithography. The surface plasmon lithography device was born under such a background. It uses a long-wavelength exposure light source to excite the surface plasmon wave that maintains the metal structure on the surface plasmon imaging device, and replaces the traditional lithography device with the propagation mode of the plasma wave. The physical propagation mode of light in China has changed the propagation law of electromagnetic waves, and realized high-efficiency and low-cost high-resolution nanolithograp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More