Excimer laser pulse energy stability control method and system

A technology of stability control and excimer laser, which is applied in the field of excimer laser, can solve the problems affecting the laser dose stability and energy stability, and achieve the effect of simple structure, obvious control effect and simple control method

Active Publication Date: 2019-04-16
RAINBOW SOURCE LASER RSLASER
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These phenomena will affect the dose sta

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  • Excimer laser pulse energy stability control method and system
  • Excimer laser pulse energy stability control method and system
  • Excimer laser pulse energy stability control method and system

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[0048] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0049] In order to make the description of the present disclosure more detailed and complete, the following provides an illustrative description of the implementation modes and specific examples of the present invention; but this is not the only form for implementing or using the specific embodiments of the present invention. The description covers features of various embodiments as well as method steps and their sequences for constructing and operating those embodiments. However, other embodiments can also be used to achieve the same or equivalent functions and step sequences.

[0050] I...

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Abstract

The invention provides an excimer laser pulse energy stability control method. The excimer laser pulse energy stability control method comprises the steps: firstly obtaining an energy measurement value of an n-th pulse in a pulse sequence; calculating a difference value between the energy measurement value and an energy set value; calculating a discharge voltage value of a next pulse according toa first mathematical model by taking a z-th pulse of the sequence as a demarcation point when n is a positive integer smaller than z; calculating the discharge voltage value of the next pulse according to a second mathematical model when n is an integer greater than z-1; and finally generating a next pulse according to the calculated discharge voltage value. The control method can effectively control the energy overshoot phenomenon in each pulse sequence and the stability of all pulse energy in one pulse sequence. The control system based on the control method comprises a high-voltage discharging module, a laser cavity, a laser parameter measuring module and an energy stability controller. The system is simple in structure, and the energy stability control over the system can be achieved only by the separation of a small amount of energy.

Description

technical field [0001] The invention relates to the technical field of excimer lasers, and more specifically, to a method for controlling the stability of excimer laser pulse energy and a control system for implementing the control method. Background technique [0002] 193nm ArF excimer laser is a pulsed gas laser for deep ultraviolet characteristic applications. It has the characteristics of high repetition frequency, high energy, short wavelength and narrow linewidth. It is an excellent laser light source for microelectronic lithography systems. The laser emitted by the excimer laser is emitted in the form of pulses. Due to the change of charge or the deterioration of the working gas, the energy between pulses is different. At the same time, the energy of the laser pulse and the set expected pulse energy also exist. Certain deviations. In the semiconductor photolithography process, the cumulative result of these deviations is overexposure or underexposure during the photo...

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Application Information

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IPC IPC(8): H01S3/13
CPCH01S3/1305H01S3/225H01S3/134
Inventor 冯泽斌韩晓泉江锐杨军红张华张琴王香廖密
Owner RAINBOW SOURCE LASER RSLASER
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