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High-resolution all-material Fresnel zone plate array and its fabrication process

An all-material, tape-sheet technology, applied in metal material coating process, instruments, optical components, etc., can solve problems such as preparation difficulties

Active Publication Date: 2022-04-08
MAX PLANCK GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN EV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Furthermore, one of the major challenges in X-ray optics is to fabricate optics that can focus hard X-rays to nanoscale resolution with high diffraction efficiency
Such optics are very difficult to fabricate since they require very high aspect ratio lenses with wavebands slanted to the Bragg angle

Method used

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  • High-resolution all-material Fresnel zone plate array and its fabrication process
  • High-resolution all-material Fresnel zone plate array and its fabrication process
  • High-resolution all-material Fresnel zone plate array and its fabrication process

Examples

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Embodiment Construction

[0086] Figure 1 shows an embodiment of a micropillar array (1 ) fabricated by plasma FIB milling a common carrier (2); in this case a single crystal Si wafer. Each micropillar (3) is located in a groove (4) formed in the common carrier (2). In the embodiment shown, said grooves (4) are right cylinders arranged in rows and columns on the common carrier (2). A microcolumn (3) is arranged at the center of each groove (4). Each micropillar (3) stands on the bottom surface (5) of the groove (4) and is oriented along the central axis of the corresponding cylinder. The depth of each groove (4) is equal to the length of each microcolumn (3). The top surface (6) of each micropillar (3) is arranged in the same plane as the upper surface (7) of the common carrier (2). The cone angle (not shown in Figure 1) of each microcolumn (3) is 1°. However, micropillar arrays (1) with any other desired cone angles can be fabricated by plasmonic or other FIBs, and allow the fabrication of ML-FZPs...

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Abstract

The invention relates to a high-resolution all-material Fresnel zone plate array, which includes a plurality of all-material Fresnel zone plates on a common carrier. It also relates to a process for fabricating an all-material Fresnel zone plate precursor array by providing a common support comprising a plurality of micropillars and depositing alternating layers of at least two different materials onto at least some of the micropillars. It also relates to a device for producing a high-resolution all-material Fresnel zone plate (FZP) array; the device for producing a high-resolution all-material Fresnel zone plate array comprises a method for providing complex A first means of micropillars, a deposition means for applying alternating layers of at least two different materials to at least some of the micropillars arranged on a common carrier, and a slicing means for separating a full-material Fresnel zone plate from Column cut out.

Description

technical field [0001] The invention relates to a high-resolution full material (full material) Fresnel zone plate array, its manufacturing process and a device for producing a high-resolution full material Fresnel zone plate (FZP) array. Background technique [0002] X-ray microscopy has proven to be an important imaging technique. In the first method, the resolution of the microscope is limited by the wavelength of the radiation used. Compared to visible light, X-rays have the advantage of shorter wavelengths, potentially allowing for higher resolution. However, conventional lenses are very limited in refracting or reflecting X-rays. Therefore, diffractive Fresnel zone plates have been regarded as the most popular and successful focusing devices for focusing X-rays, especially in soft X-ray energies. The (all-material) Fresnel zone plate is a diffractive lens composed of multilayers comprising at least two materials as zones of the FZP. In view of the rapid development...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18C23C16/455
CPCC23C16/45555G02B5/1876G02B5/1885C23C16/45536
Inventor 乌穆特·腾卡·桑利吉泽拉·许茨卡拉曼·凯斯金博拉焦成革
Owner MAX PLANCK GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN EV