Anti-collision device and workpiece table system

Abstract

The invention discloses an anti-collision device, which comprises a frame, a first buffer structure, a second buffer structure and a connecting component. One end of the first buffer structure and oneend of the second buffer structure are rotationally connected at an acute angle through the connecting component, and the other end of the first buffer structure and the other end of the second buffer structure are arranged on the frame. According to the anti-collision device of the invention, an impact force in any direction applied under the guide of the connecting component is converted into the vertical forces of the two buffer structures through the two buffer structures rotationally connected at an acute angle at one end through the connecting component, and the problem that the traditional one-dimensional oil pressure buffer or memory alloy anti-collision bar can only prevent collision in one direction is solved. The anti-collision device has a simple structure layout, and is veryconvenient to install and debug and lighter. The anti-collision device does not occupy vertical space. When the anti-collision device is applied to a work piece stage system, a lot of space can be saved, and subsequent upgrade and improvement of the work piece stage system can be facilitated.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to an anti-collision device, a workpiece platform system and a photolithography machine including the anti-collision device. Background technique [0002] Photolithography is a very important process in the semiconductor manufacturing process. It is a process of sequentially transferring chip patterns on a series of reticles to corresponding layers of silicon wafers through exposure. It is the core step in the manufacture of large-scale integrated circuits. A series of complex and time-consuming photolithography processes in semiconductor manufacturing are mainly completed by corresponding photolithography machines. [0003] The lithography machine includes multiple workpiece tables, and the position of each workpiece table needs to be adjusted during specific photolithography. Inevitably, the workpiece table of the lithography machine may collide in various situations dur...

AI Technical Summary

Problems solved by technology

[0004] Most of the known existing anti-collision devices are one-dimensional oil pressure buffers, memory alloy anti-collision strips or anti-collision components composed of multiple memory alloys. In these methods, one-dimensional oil pressure buffers and memory alloys The alloy anti-collision strip can only prevent collisions in one direction, and has no effect on other possible collisions such as oblique collisions; although the anti-collision parts composed of multiple memory alloys can prevent collisions in any direction, it takes up a lot of space and itself Insufficient aspects such as heavy weight, complex installation and debugging, and difficult simulation

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