Method for detecting miRNA-21 through carboxylated graphene oxide modified electrodes
A miRNA-21, modified electrode technology, applied in the detection field, can solve the problems of difficult to develop miRNA, high sequence similarity, low abundance, etc., to achieve the effect of enhancing current intensity and surface area, stabilizing electrochemical signals, and improving accuracy
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Embodiment 1
[0033] A method for detecting miRNA-21 at a carboxylated graphene oxide modified electrode, comprising:
[0034] Step 1. Electrode modification: a. Drop the miRNA-21 aptamer solution with a concentration of 2 μM onto the surface of the gold electrode, place it in an environment at 4°C for 12 hours, wash it with a PBS solution with a pH of 7.4 for 25 seconds, and wash it with ultrapure water Rinse well and blow dry with nitrogen;
[0035] b. Add the mercaptoethanol solution with a concentration of 1mM dropwise to the surface of the gold electrode in step a until the surface of the gold electrode is covered with the mercaptoethanol solution. After placing it at 4°C for 1 hour, wash it with a PBS solution with a pH of 7.4 for 25 seconds. Rinse with ultrapure water and blow dry with nitrogen;
[0036] c. Add the reaction solution dropwise to the surface of the gold electrode in step b, place it in an environment of 55°C for 125 minutes, rinse it with a PBS solution with a pH of 7...
Embodiment 2
[0051] The method for detecting miRNA-21 at a carboxylated graphene oxide modified electrode is the same as in Example 1, wherein, it also includes: before step 1, the gold electrode is subjected to the following treatment:
[0052] Place the gold electrode in NaHCO 3 In an ultrapure aqueous solution with a concentration of 5 μM and a concentration of KCl of 10 μM, soak for 40 minutes in a water bath at a temperature of 65 ° C, rinse with ultrapure water, and then place it in an ultrapure aqueous solution with a concentration of acetic acid of 5 μM and a concentration of silicic acid of 2 μM , soaked in a water bath at a temperature of 80°C for 60 minutes, rinsed with ultrapure water, polished with 0.05 μm polishing powder on a polishing cloth, and rinsed with ultrapure water.
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