Recycling and regeneration method of alkaline etching liquid

A technology of cyclic regeneration and etching solution, applied in the improvement of process efficiency, photography process, instruments, etc., can solve the problems of waste etching solution treatment troubled enterprises and other problems, so as to meet the needs of etching production, reduce production and operation costs, and realize automatic control. Effect

Inactive Publication Date: 2019-07-05
GUANGZHOU JICHI ENVIRONMENTAL TECH CO LTD
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the treatment of waste etching solution has always been a problem that plagues enterprises.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Recycling and regeneration method of alkaline etching liquid
  • Recycling and regeneration method of alkaline etching liquid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The recycling device for alkaline etching solution provided by the present invention will be described in detail below.

[0032] refer to figure 1 , a recycling device 10 for alkaline etching solution, including a connected circulating storage system and an extraction system, the circulating storage system includes an etching waste solution tank 110, a regeneration solution tank 111 and a regeneration solution preparation tank 112 for temporary storage and circulating alkaline etching waste liquid and alkaline etching regeneration liquid; the regeneration liquid tank 111 communicates with the alkaline etching line (SES line) 20, uses the regeneration liquid for the etching process, and connects the SES line 20 with the etching waste The liquid tank 110 is communicated, and the etching waste liquid that produces is collected in the etching waste liquid tank 110; The extraction system includes a connected copper extraction separator 121 and a stripping separator 122, and ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a recycling and regeneration method of an alkaline etching liquid. The recycling and regeneration method of the alkaline etching liquid includes the steps that S1, a regenerated etching liquid in a regenerated liquid tank is transported to an alkaline etching line (SES) for etching, and then a generated waste etching liquid is collected into an etching waste liquid tank; S2, the waste etching liquid is transported from the etching waste liquid tank to a copper extraction separator to separate and capture copper ions with a copper extractant; S3, after extraction is carried out, the waste etching liquid is separated from the extractant, and the waste etching liquid is collected into a regenerated liquid blending tank, the concentration of the waste etching liquid isblended and the blended waste etching liquid is re-transported to the regenerated liquid tank; and S4, the copper extractant is transported to a stripping separator, and the copper ions are subjectedto stripping and separated by a sulfuric acid solution to prepare the copper ions containing a copper solution to facilitate the treatment of the waste copper ions. By adopting the recycling and regeneration device and method of the alkaline etching liquid, the recycling and regeneration of the etching waste liquid is realized, the utilization rate can be above 98%, and thus the discharge of pollution waste from PCB enterprises is greatly reduced.

Description

technical field [0001] The invention relates to the field of printed circuit board etching, in particular to a recycling method for alkaline etching solution of printed circuit boards. Background technique [0002] Printed circuit boards are the foundation of the electronic information industry, and advanced technology products are inseparable from printed circuit boards. Due to the large amount of etching waste liquid produced during the etching process of printed circuit boards, it contains a large amount of components harmful to the environment, such as copper ions and the like. Therefore, the treatment of waste etching solution has always been a problem that plagues enterprises. Contents of the invention [0003] The technical purpose of the present invention is to provide a recycling device and method for alkaline etching solution. [0004] Technical purpose of the present invention is achieved through the following technical solutions: [0005] A recycling device ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C23F1/08C22B7/00C22B15/00C25C1/12
CPCC22B7/006C22B15/0084C23F1/08C23F1/46C25C1/12Y02P10/20
Inventor 罗宝奎陈永江
Owner GUANGZHOU JICHI ENVIRONMENTAL TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap