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Reaction chamber structure of tubular PECVD equipment

A reaction chamber and equipment technology, applied in the field of tubular PECVD equipment, can solve the problems of gas thinning, flow field stability and uniformity reduction, etc., to achieve uniformity improvement, gas flow field stability and uniformity improvement, and modification compatibility. good effect

Active Publication Date: 2019-07-23
HUNAN RED SUN PHOTOELECTRICITY SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing air intake method will cause the gas in the central area of ​​the cross-section of the reaction chamber to be thin, and the stability and uniformity of the flow field will be reduced, and the thickness of the anti-reflection film on the silicon wafer in the middle of the graphite boat is slightly thinner than that on both sides.

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  • Reaction chamber structure of tubular PECVD equipment
  • Reaction chamber structure of tubular PECVD equipment
  • Reaction chamber structure of tubular PECVD equipment

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Embodiment Construction

[0028] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0029] Such as Figure 1 to Figure 7 As shown, the reaction chamber structure of the tubular PECVD equipment of the present embodiment includes a quartz furnace tube 1, a transition cylinder 2, a furnace door 3 and a rear end face flange 4, and the transition cylinder 2 is arranged on the front end of the quartz furnace tube 1 (with One end of the furnace door 3 is the front end), the furnace door 3 is connected with the transition cylinder 2, the rear end face flange 4 is arranged at the rear end of the quartz furnace tube 1, the rear end face flange 4 is provided with an air inlet pipe 5 on the outside, and an inside is provided with A uniform air distribution plate 6, a plurality of air distribution holes 7 are evenly distributed on the uniform air distribution plate 6, a buffer air intake cavity 8 is provided between the uniform a...

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Abstract

The invention discloses a reaction chamber structure of tubular PECVD equipment. The reaction chamber structure comprises a quartz furnace tube, a transition barrel, a furnace door and a rear end faceflange. The transition barrel is arranged at the front end of the quartz furnace tube. The rear end face flange is arranged at the rear end of the quartz furnace tube. Gas inlet tubes are arranged onthe outer side of the rear end face flange, a uniform gas distribution plate is arranged on the inner side of the rear end face flange, and multiple gas distribution holes are formed in the uniform plate. A buffer gas inlet cavity is formed between the uniform plate and the inner side of the rear end face flange. The gas inlet pipe and the gas distribution holes communicate with the buffer gas inlet cavity. An inner cover is arranged in the transition barrel. The inner cover is connected with the furnace door. The inner cover covers a tube opening of the quartz furnace tube. A flow guide tubeis arranged on the inner cover. An extraction opening is formed in the transition barrel. The two ends of the flow guide tube are connected with the quartz furnace tube and the exhaust opening. According to the reaction chamber structure, original front end annular gas inlet is changed into rear-end plane gas inlet, process gas can be rapidly and uniformly distributed in the quartz furnace tube,gas flow field stability and uniformity are greatly improved, the extraction opening is formed in the transition barrel, and the problem that the front-end furnace door moves and gas enters is avoided.

Description

technical field [0001] The invention relates to tubular PECVD equipment, in particular to a reaction chamber structure of tubular PECVD equipment. Background technique [0002] Photovoltaic power generation system is a new type of power generation system that uses the "photovoltaic effect" of solar cell semiconductor materials to directly convert solar radiation energy into electrical energy. Solar cells, also known as photovoltaic cells, are the core devices in photovoltaic power generation systems. At present, the solar cell with the most mature technology, commercial value and widest application in the market is the crystalline silicon solar cell. The reflection loss rate of sunlight on the surface of crystalline silicon is as high as about 35%, which seriously affects the final conversion efficiency of solar cells. In order to improve conversion efficiency, that is, reduce the reflection of sunlight on the surface of crystalline silicon, one or more layers of silicon d...

Claims

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Application Information

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IPC IPC(8): C23C16/513C23C16/455
CPCC23C16/45568C23C16/513
Inventor 郭艳吴得轶李明
Owner HUNAN RED SUN PHOTOELECTRICITY SCI & TECH