Supercharge Your Innovation With Domain-Expert AI Agents!

Vertical and horizontal dual-function coupler based on elliptical multimode interference

A multi-mode interference, vertical and horizontal technology used in the field of optical communication

Active Publication Date: 2020-09-29
SHANGHAI JIAOTONG UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no technology to combine the two coupling methods on the same optical chip and use them in the same optical system.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vertical and horizontal dual-function coupler based on elliptical multimode interference
  • Vertical and horizontal dual-function coupler based on elliptical multimode interference
  • Vertical and horizontal dual-function coupler based on elliptical multimode interference

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] Such as figure 1 a and figure 1 As shown in b, this embodiment includes: an elliptical multimode interferometer 3 and a grating coupler 1 connected to it for vertical coupling, an end coupler 2 for end coupling, and a silicon-based chip Optical system 4, wherein: the grating coupler 1 and the end face coupler 2 are used in time-sharing, and the elliptical multimode interferometer is optimized for one main input waveguide 301 or balanced for two channels 304 and 305 .

[0017] Such as figure 2 , image 3 As shown, the design parameters of the elliptical multimode interferometer 3 include: the width of the main input waveguide, the angle and position where the main input waveguide is inserted into the elliptical region, the width of the secondary input waveguide, the angle and position where the secondary input waveguide is inserted into the elliptical region, and the output The width of the waveguide, the angle and position at which the output waveguide is inserted i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a vertical horizontal dual-function coupler based on elliptical multi-mode interference comprising an elliptical multi-mode interferometer, an optical grating coupler used forperforming vertical coupling , and an end surface coupler used for performing end surface coupling; the optical grating coupler and the end surface coupler are respectively connected with the elliptical multi-mode interferometer, wherein the optical grating coupler and the end surface coupler are used in a time-sharing mode, and the elliptical multi-mode interferometer is optimized for one main input waveguide or is balanced for two channels. According to the vertical horizontal dual-function coupler in the invention, the test of the silicon wafer machining process can be satisfied, and the effect during final packaging is not influenced.

Description

technical field [0001] The invention relates to a technology in the field of optical communication, in particular to a passive end face / vertical coupling system for silicon-based optoelectronic chips. Background technique [0002] The current mainstream fiber-silicon chip waveguide coupling schemes include end-face coupling schemes realized by using silicon-based mode-spot converters or adiabatic coupling conditions, and vertical coupling schemes realized by using the diffraction properties of gratings. Among them, the end-face coupling scheme has the advantages of small package size requirements and high coupling efficiency, which is conducive to mass production. The vertical coupling scheme has the advantages of flexible placement and can be tested during silicon wafer processing. It is mostly used in a laboratory environment and is convenient for R&D and testing. However, there is currently no technology to combine the two coupling methods on the same optical chip and us...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/30G02B6/26
CPCG02B6/262G02B6/264G02B6/30
Inventor 何祖源张文甲庞拂飞张万强
Owner SHANGHAI JIAOTONG UNIV
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More