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Gas barrier film and method for producing gas barrier film

A technology of gas barrier and manufacturing method, applied in the direction of surface coating liquid device, gaseous chemical plating, metal material coating process, etc., can solve the problems of high elastic modulus and insufficient crack resistance, and achieve maintenance Effects of crack resistance, resistance improvement, and high gas barrier properties

Active Publication Date: 2019-08-09
KONICA MINOLTA INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the elastic modulus is high and the crack resistance at the time of cutting is insufficient

Method used

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  • Gas barrier film and method for producing gas barrier film
  • Gas barrier film and method for producing gas barrier film
  • Gas barrier film and method for producing gas barrier film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0332] Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not limited to these. In addition, the expression of "part" or "%" is used in an Example, Unless otherwise specified, it means "part by mass" or "% by mass".

[0333] [Making of base material]

[0334] The base material [1] in which the hard-coat layer was formed on the both surfaces of a support body was produced by the following method.

[0335] (support body)

[0336] A 50-μm-thick PET film, KFL12W#50, manufactured by Teijin DuPont Films Co., Ltd., had an easy-adhesive layer on both surfaces.

[0337] (Preparation of hard coat coating solution [HC1])

[0338] A hard coat coating solution [HC1] obtained by mixing the following materials was prepared.

[0339]

[0340] (Making of substrate [1])

[0341] Using a roll-to-roll coating device, apply the hard coat coating solution [HC1] on one side of the support (PET film) to a dry layer thickness of 4 μm and dr...

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PUM

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Abstract

This gas barrier film is obtained by forming a first gas barrier layer and a second gas barrier layer sequentially in this order on a substrate. The second gas barrier layer is a polysilazane modifiedlayer; and the elastic modulus and the hardness of the surface of the second gas barrier layer as determined by a nanoindentation method satisfy the conditions [A] and [B] described below. [A] The elastic modulus is within the range of 8-17 GPa. [B] The hardness satisfies the relational expression described below. (hardness) <= 0.18 * (elastic modulus) + 2.1 GPa

Description

technical field [0001] The present invention relates to a gas barrier that can maintain high gas barrier properties and crack resistance during cutting, and can maintain high gas barrier properties even when subjected to a treatment such as a point-shaped impact on the surface of a gas barrier layer. A method for producing a gas-barrier film and a gas-barrier film. Background technique [0002] In various devices such as optical elements, liquid crystal displays or organic EL (electroluminescence, electroluminescence) displays, various semiconductor devices, solar cells, etc., water vapor transmission is used in parts and components that require high moisture resistance. Excess (WVTR) is less than 0.001g / (m 2 • 24hr) gas barrier film. [0003] A flexible device using a gas-barrier film is characterized in that each unit can be diced after the parts and parts requiring high moisture resistance of a large number of units are collectively sealed with the gas-barrier film. In...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/00B05D3/06B05D5/00B05D7/04B05D7/24C23C16/42
CPCB05D3/06B05D5/00B05D7/04B05D7/24B32B9/00C23C16/42
Inventor 高木宏司森孝博
Owner KONICA MINOLTA INC
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