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Chemical cleaning device and chemical cleaning method using the same

A technology of chemical cleaning and cleaning liquid, applied in the field of chemical cleaning, can solve the problems of boiler water supply or steam leakage, metal temperature rise, etc.

Active Publication Date: 2019-08-16
MITSUBISHI POWER LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] On the other hand, in some thermal power generation systems to which CWT is applied, the temperature of the metal of the furnace wall tube of the once-through boiler may rise, which may cause leakage of boiler water or steam due to damage to the furnace wall tube. situation becomes problematic

Method used

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  • Chemical cleaning device and chemical cleaning method using the same
  • Chemical cleaning device and chemical cleaning method using the same
  • Chemical cleaning device and chemical cleaning method using the same

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Experimental program
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no. 1 approach 〕

[0092] Hereinafter, a first embodiment of the present invention will be described with reference to the drawings.

[0093] figure 1 It is a schematic diagram illustrating the thermal power generation system 100 of the first embodiment, and shows a state where the chemical cleaning device 200 is installed during cleaning and maintenance of the inside of the furnace evaporator and the like.

[0094] Such as figure 1 As shown, the thermal power generation system 100 of this embodiment includes, for example, a once-through boiler 10, a turbine (steam turbine) 20, a condenser 30, a condensation desalination device 40, a basic steam condenser 50, a low-pressure feed water heater 60, a deaerator 70, High pressure water heater 80. The once-through boiler 10 includes a furnace evaporator 11 , a flue evaporator 12 , an economizer 13 , a gas-water separator 14 , a superheater 15 , and a reheater 16 . The flue evaporator 12 is connected to the furnace evaporator 11 through pipes or the...

no. 2 approach 〕

[0199] Next, a second embodiment of the present invention will be described with reference to the drawings.

[0200] This embodiment is a modified example of the first embodiment, and is the same as the first embodiment except for the case described below.

[0201] The control unit 270 of the first embodiment starts the second cleaning step when a predetermined time elapses after the start of the first cleaning step. On the other hand, the control unit 270 of the present embodiment controls the pressure of the cleaning liquid on the upstream side of the first filter F1, the second filter F2, and the third filter F3 of the sludge recovery facility 240 and the pressure of the cleaning liquid on the downstream side. When the differential pressure measured by the first differential pressure measuring part PS1, the second differential pressure measuring part PS2 and the third differential pressure measuring part PS3 exceeds a predetermined value, the second cleaning process starts....

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Abstract

The present invention provides a chemical cleaning device and a chemical cleaning method using the same so as to prevent inflow of a cleaning liquid to an adjacent device of an evaporator disposed ina furnace of a direct current boiler. The chemical cleaning device (200) includes: a chemical liquid tank (210); a supplementation water tank (220); circulation lines (L1 to L6) for circulating the cleaning liquid to an upper header (11A) and a lower header (11B) of a furnace evaporator (11); a circulation pump (230); a sludge recycling device (240) for recycling scale particles; control valves (V1 to V4) for adjusting the flow rate of the cleaning liquid flowing through the circulation lines (L1 to L6); a liquid level detecting portion (280) for detecting the height of the liquid level of thecleaning liquid in the piping connecting the furnace evaporator (11) and a flue evaporator; and a control unit (270) that prompts and / or controls the adjustment of the control valves (V3, V4) according to the height of the detected liquid level of the cleaning liquid in order to prevent the cleaning liquid from being guided to the flue evaporator.

Description

technical field [0001] The present invention relates to a chemical cleaning device for chemically cleaning hematite scale adhering to a furnace evaporator disposed in a furnace of a once-through boiler, and a chemical cleaning method using the chemical cleaning device. Background technique [0002] Conventionally, a thermal power generation system including a once-through boiler and applying oxygen treatment (OT: Oxygen Treatment) to a boiler water supply system is known. As one of OTs, there is combined water treatment (CWT: Combined Water Treatment), and it may be applied to a thermal power plant equipped with a once-through boiler. In CWT, in order to suppress scale adhesion or scale growth rate, ammonia is added to make the pH of the boiler feed water alkaline (pH8.0-9.0), and by adding a small amount of oxygen (O 2 ) to form a protective film for the oxide film on the inner surface of the heat transfer tube. [0003] On the other hand, in some thermal power generation...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F28G9/00F28G15/00
CPCF28G9/00F28G15/003F28G2015/006
Inventor 和田贵行真保阳一
Owner MITSUBISHI POWER LTD