Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Microwave CVD nano waterproof compound technology

A composite process, microwave technology, applied in the direction of metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of slow deposition speed, poor coating uniformity and compactness, long processing time, etc., to achieve uniformity And the effect of high density, good coating quality and high efficiency

Inactive Publication Date: 2019-09-03
何金宁 +1
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The current nano-waterproofing process mainly uses high-frequency or intermediate-frequency CVD to coat products (usually circuit boards) with fluorocarbons as the working gas. This process takes a long time and slow deposition speed. The utilization rate is also relatively low, and the uniformity and compactness of the final deposited coating are relatively poor, and the high-level waterproof and hydrophobic properties cannot be achieved.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Embodiment 1: a kind of microwave CVD nano-waterproof compound process, comprises the following steps: (1) the pretreatment of circuit substrate: put circuit substrate into ultrasonic cleaning machine and dry with hot air after cleaning with ethylene glycol, then Place the baked circuit substrate in the vacuum reaction chamber of the microwave CVD equipment; (2) pretreatment of the circuit substrate: adjust and keep the temperature in the vacuum reaction chamber in step (1) between 25°C, and react to the vacuum Vacuumize the chamber so that the internal vacuum degree is 50KPa, pass the clean treatment gas Ar gas to 70KPa, place it in the microwave area with a frequency of 300GHz for 2S to carry out glow discharge treatment; (3) process the process in step (2) The vacuum degree of the vacuum reaction chamber for glow discharge treatment is evacuated to below 20KPa, placed in the microwave area with a frequency of 500GHz, and the first gas (steam after heating and vaporizi...

Embodiment 2

[0024] Embodiment 2: a kind of microwave CVD nano-waterproof compound process, comprises the following steps: (1) the pretreatment of circuit substrate: put circuit substrate into ultrasonic cleaning machine and dry with hot air after cleaning with ethylene glycol, then Place the baked circuit substrate in the vacuum reaction chamber of the microwave CVD equipment; (2) pretreatment of the circuit substrate: adjust and keep the temperature in the vacuum reaction chamber in step (1) between 30°C, and react to the vacuum Vacuumize the cavity so that the internal vacuum degree is 60KPa, pass the clean treatment gas Ar gas to 80KPa, place it in the microwave area with a frequency of 400GHz for 10S to carry out glow discharge treatment; (3) process the process in step (2) The vacuum degree of the vacuum reaction chamber for glow discharge treatment is pumped to below 20KPa, placed in the microwave area with a frequency of 600GHz, and the first gas (HMDSO) is introduced at 1L / min, and...

Embodiment 3

[0025] Embodiment 3: a kind of microwave CVD nano-waterproof compound process, comprises the following steps: (1) the pretreatment of circuit substrate: put circuit substrate into ultrasonic cleaning machine and dry with hot air after cleaning with ethylene glycol, then Place the baked circuit substrate in the vacuum reaction chamber of the microwave CVD equipment; (2) pretreatment of the circuit substrate: adjust and keep the temperature in the vacuum reaction chamber in step (1) between 40°C, and react to the vacuum The cavity is vacuumed to make the internal vacuum degree 70KPa, and the clean treatment gas O 2 Gas to 90KPa, placed in the microwave region of 460GHz for 50S to carry out glow discharge treatment; (3) the vacuum degree of the vacuum reaction chamber processed by glow discharge in step (2) is evacuated to below 20KPa, placed in a frequency of 460GHz In the microwave area of ​​700GHz, the first gas (HMDSM) is introduced at 1L / min, and the vacuum degree in the vac...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a microwave CVD nano waterproof compound technology. The compound technology comprises the following steps of (1), pretreatment of a circuit board; (2) preliminary treatment of the circuit board; (3), pumping a vacuum reaction chamber till the vacuum degree is 20KPa or below, placing the vacuum reaction chamber in a microwave region with the frequency of 500-1000 GHz, introducing first gas at 0.5-2 L / min, keeping the vacuum degree in the vacuum reaction chamber at 10-30 kPa, ionizing the first gas to form an active ion monomer, and depositing a barrier insulating filmlayer on the surface of the circuit board; (4), pumping out the gas in the vacuum reaction chamber, introducing second gas to make the pressure in the vacuum reaction chamber reach 10-200 kPa, placingthe second gas at a microwave region with the frequency of 800-1200 GHz to ionize the second gas so as to form a hydrophobic oleophobic corrosion resistant coating with the thickness of 10-500 nm onthe surface of the barrier insulating film layer obtained from the step (3); and (5), post-treatment, and specifically introduced air into the vacuum reaction chamber to reach the standard atmospheric pressure, and taking out the circuit board. The microwave CVD technology has the characteristics of high efficiency, the deposition time is only half of that of a current technology in the industry,and the deposition efficiency is improved by about 2 times.

Description

technical field [0001] The invention specifically relates to a microwave CVD nanometer waterproof composite process. Background technique [0002] The current nano-waterproofing process mainly uses high-frequency or intermediate-frequency CVD to coat products (usually circuit boards) with fluorocarbons as the working gas. This process takes a long time and slow deposition speed. The utilization rate is also relatively low, and the uniformity and compactness of the final deposited coating are relatively poor, and the high-level waterproof and hydrophobic properties cannot be achieved. Contents of the invention [0003] In order to overcome the disadvantages of the above-mentioned situation, the present invention aims to provide a technical solution capable of solving the above-mentioned problems. [0004] A microwave CVD nanometer waterproof composite process, comprising the following steps: [0005] 1. A microwave CVD nanometer waterproof composite process, characterized...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/511
CPCC23C16/511
Inventor 何金宁陆珺
Owner 何金宁
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products