Microwave CVD nano waterproof compound technology
A composite process, microwave technology, applied in the direction of metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of slow deposition speed, poor coating uniformity and compactness, long processing time, etc., to achieve uniformity And the effect of high density, good coating quality and high efficiency
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Embodiment 1
[0023] Embodiment 1: a kind of microwave CVD nano-waterproof compound process, comprises the following steps: (1) the pretreatment of circuit substrate: put circuit substrate into ultrasonic cleaning machine and dry with hot air after cleaning with ethylene glycol, then Place the baked circuit substrate in the vacuum reaction chamber of the microwave CVD equipment; (2) pretreatment of the circuit substrate: adjust and keep the temperature in the vacuum reaction chamber in step (1) between 25°C, and react to the vacuum Vacuumize the chamber so that the internal vacuum degree is 50KPa, pass the clean treatment gas Ar gas to 70KPa, place it in the microwave area with a frequency of 300GHz for 2S to carry out glow discharge treatment; (3) process the process in step (2) The vacuum degree of the vacuum reaction chamber for glow discharge treatment is evacuated to below 20KPa, placed in the microwave area with a frequency of 500GHz, and the first gas (steam after heating and vaporizi...
Embodiment 2
[0024] Embodiment 2: a kind of microwave CVD nano-waterproof compound process, comprises the following steps: (1) the pretreatment of circuit substrate: put circuit substrate into ultrasonic cleaning machine and dry with hot air after cleaning with ethylene glycol, then Place the baked circuit substrate in the vacuum reaction chamber of the microwave CVD equipment; (2) pretreatment of the circuit substrate: adjust and keep the temperature in the vacuum reaction chamber in step (1) between 30°C, and react to the vacuum Vacuumize the cavity so that the internal vacuum degree is 60KPa, pass the clean treatment gas Ar gas to 80KPa, place it in the microwave area with a frequency of 400GHz for 10S to carry out glow discharge treatment; (3) process the process in step (2) The vacuum degree of the vacuum reaction chamber for glow discharge treatment is pumped to below 20KPa, placed in the microwave area with a frequency of 600GHz, and the first gas (HMDSO) is introduced at 1L / min, and...
Embodiment 3
[0025] Embodiment 3: a kind of microwave CVD nano-waterproof compound process, comprises the following steps: (1) the pretreatment of circuit substrate: put circuit substrate into ultrasonic cleaning machine and dry with hot air after cleaning with ethylene glycol, then Place the baked circuit substrate in the vacuum reaction chamber of the microwave CVD equipment; (2) pretreatment of the circuit substrate: adjust and keep the temperature in the vacuum reaction chamber in step (1) between 40°C, and react to the vacuum The cavity is vacuumed to make the internal vacuum degree 70KPa, and the clean treatment gas O 2 Gas to 90KPa, placed in the microwave region of 460GHz for 50S to carry out glow discharge treatment; (3) the vacuum degree of the vacuum reaction chamber processed by glow discharge in step (2) is evacuated to below 20KPa, placed in a frequency of 460GHz In the microwave area of 700GHz, the first gas (HMDSM) is introduced at 1L / min, and the vacuum degree in the vac...
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