Unlock instant, AI-driven research and patent intelligence for your innovation.
Silicon lens array design method
What is Al technical title?
Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A design method and silicon lens technology, applied in the fields of lenses, optics, instruments, etc., can solve the problems of increasing assembly difficulty and increasing cost, and achieve the effect of reducing assembly difficulty and cost
Inactive Publication Date: 2019-09-10
合肥嘉东光学股份有限公司
View PDF5 Cites 0 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
[0003] At present, the silicon array lens used in the optical module needs to cooperate with a 45° turning prism to deflect the direction of light transmission, but this will cause the following problems: first, increase the cost; The parallelism between the turning prisms increases the difficulty of assembly
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0037] S1, choose a suitable silicon array lens.
[0038] S2, the silicon array lens does not undergo bevel grinding.
[0039] S3, combined with a 45-degree turning prism,
[0040] S4, through installation and debugging.
[0041] The silicon array lens uses a melting method to prepare a spherical crown-shaped photoresistmask, and uses ion beam etching to realize the transfer of the spherical crown shape to the silicon wafer, which is effective at a lower substrate temperature (less than 200 °C). ) prepared a silicon microlens array, and confirmed that the microlenses are spherical caps by scanning electronmicroscopy (SEM) and surface probe experiments.
[0042] The distance between each silicon lens is 0.25-0.75 mm.
[0043] The outer diameter of the silicon lens is 0.2-0.7m.
[0044] The optical surface of the silicon lens is a convex spherical surface.
[0046] Embodiment conclusion: above-mentioned steps have adopted s...
Embodiment 2
[0048] S1, choose a suitable silicon array lens.
[0049] S2, grinding the original light emitting surface of the silicon array lens in S1 into a 45° slope.
[0050] S3, with the PD side provided according to S2 above.
[0051] S4, according to the above S2 provided with a parallel light side.
[0052] S5, provided with a mirror side according to S2 above.
[0053] S6, after the above steps S1-S5 are completed, the light is deflected at 45° after total reflection on the 45-degree slope and then emitted.
[0054] The silicon array lens uses a melting method to prepare a spherical crown-shaped photoresistmask, and uses ion beam etching to realize the transfer of the spherical crown shape to the silicon wafer, which is effective at a lower substrate temperature (less than 200 °C). ) prepared a silicon microlens array, and confirmed that the microlenses are spherical caps by scanning electronmicroscopy (SEM) and surface probe experiments.
[0055] The distance between each s...
Embodiment
[0061] Example conclusion: the present invention adopts the integrated design of the silicon array lens and the 45° turning prism, that is, one optical element is used to complete the functions of two optical elements, and it performs relatively well in actual use, including installation and debugging time and cost control .
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More
PUM
Property
Measurement
Unit
Outer diameter
aaaaa
aaaaa
Login to View More
Abstract
The present invention discloses a siliconlens array design method. The present invention, in order to solve the defects of high cost and great assembling difficulty in the prior art, has step S1 of selecting a proper silicon array lens; step S2 of grinding the original light-emitting area of the silicon array lens in S1 into a 45 DEG slope; step S3 of disposing a PD side according to the above S2; step S4 of disposing a parallel light side according to the above S2; step S5 of disposing a mirror side according to the above S2; and step S6 of deflecting light after being totally reflected at the 45 DEG slope for 45 DEG and emitting it out after the above steps S1-S5 are finished. The silicon array lens prepares a photoresistmask of a spherical cap with a fusion method and realizes transfer of the spherical cap to a silicon chip with ion beam etching. The interval of each silicon lens is 0.25-0.75mm, the outer diameter of the silicon lens is 0.2-0.7mm, the optical surface of the silicon lens is a convex spherical surface and curvature radius is 3.5-3.7 mm. The present invention adopts an integral design of the silicon array lens and a 45 DEG deflection prism, such that an optical element finishes functions of two optical elements. Therefore, the method has the advantages of reducing cost and assembling difficulty.
Description
technical field [0001] The invention relates to the technical field of optical equipment, in particular to a silicon lens array design method. Background technique [0002] Optics is an important branch of physics and a subject related to optical engineering technology. In a narrow sense, optics is the science of light and vision, while optics is often said today in a broad sense, which is the study of the generation of electromagnetic radiation in a wide range of wavelengths from microwaves, infrared rays, visible light, ultraviolet rays to X-rays and gamma rays , transmission, reception and display, and the science of interaction with matter, focusing on the range of research from infrared to ultraviolet bands. It is an important part of physics. Optics is a physical subject that studies the behavior and properties of light. Light is An electromagnetic wave. In physics, electromagnetic waves are described by Maxwell's equations in electrodynamics. At the same time, light ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to View More