Method for efficiently removing boron and phosphorus in silicon
A high-efficiency and high-purity technology, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of high cost, low boron and phosphorus removal efficiency, and achieve low cost, high industrial value, and low melting temperature. Effect
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Embodiment 1
[0025] Mix 60g of metallurgical-grade silicon, 140g of high-purity aluminum, and 1.4g of high-purity hafnium, put them into an alumina crucible, and heat up to 1200°C at a rate of 3K / min in a well-type furnace; stir with a quartz rod to mix evenly, and then Cool down to 25°C at a rate of 1K / min to obtain solidified Alloy I; put Alloy I in hydrochloric acid at 50°C, and place it for 48 hours to remove the matrix of Alloy I to obtain primary silicon wafer I; use a mortar to grind the primary silicon wafer I Obtain silicon particles with a particle size of <10 μm; put the silicon particles in hydrochloric acid at 50° C. for 48 hours, then wash the silicon particles with deionized water and dry them at 50° C. Mix 30g of dried silicon particles, 70g of high-purity aluminum, and 0.15g of high-purity calcium, put them into an alumina crucible, heat up to 1300°C at a rate of 3K / min in a pit furnace; stir with a quartz rod to mix them Uniform, and then cool down to 25°C at a rate of 1K...
Embodiment 2
[0027] Mix 60g of metallurgical-grade silicon, 140g of high-purity aluminum, and 7g of high-purity hafnium, put them into an alumina crucible, and raise the temperature to 1200°C at a rate of 3K / min in a well-type furnace; stir with a quartz rod to mix evenly, and then Cool down at a rate of 1K / min to 28°C to obtain solidified Alloy I; put Alloy I in hydrochloric acid at 50°C, and place it for 48 hours to remove the matrix of Alloy I to obtain primary silicon wafer I; use a mortar to grind primary silicon wafer I Obtain silicon particles of <10 μm; place the silicon particles in hydrochloric acid at 50° C. for 48 hours, then wash the silicon particles with deionized water and dry them at 60° C. Mix 30g of dried silicon particles, 70g of high-purity aluminum, and 0.7g of high-purity calcium, put them into an alumina crucible, and heat up to 1300°C at a rate of 3K / min in a pit furnace; stir them with a quartz rod to mix them Uniform, then cool down to 28°C at a rate of 1K / min to...
Embodiment 3
[0029] Mix 60g of metallurgical-grade silicon, 140g of high-purity aluminum, and 13g of high-purity hafnium, put them into an alumina crucible, and raise the temperature to 1300°C at a rate of 3K / min in a well-type furnace; stir with a quartz rod to mix evenly, and then Cool down to 30°C at a rate of 1K / min to obtain solidified Alloy I; put Alloy I in hydrochloric acid at 50°C, and place it for 48 hours to remove the matrix of Alloy I to obtain primary silicon wafer I; use a mortar to grind primary silicon wafer I Obtain silicon particles of <10 μm; place the silicon particles in hydrochloric acid at 50° C. for 48 hours, then wash the silicon particles with deionized water and dry them at 55° C. Mix 30g of dried silicon particles, 70g of high-purity aluminum, and 1.4g of high-purity calcium, put them into an alumina crucible, and heat up to 1200°C at a rate of 3K / min in a pit furnace; stir them with a quartz rod to mix them Uniform, then cool down to 30°C at a rate of 1K / min t...
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