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Method for producing a metal decoration on a dial and dial obtained according to said method

A technology for metal decoration and decorations, applied in the field of dome ceramic dials, can solve problems such as hindering the installation of decorations

Active Publication Date: 2019-09-17
THE SWATCH GRP RES & DEVELONMENT LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] The manufacture of metal decorations by electrodeposition according to this prior art method is carried out on a flat surface and its implementation on a part with a domed surface is much more complicated because the curvature of the part prevents the decoration from being properly fitted

Method used

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  • Method for producing a metal decoration on a dial and dial obtained according to said method
  • Method for producing a metal decoration on a dial and dial obtained according to said method
  • Method for producing a metal decoration on a dial and dial obtained according to said method

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Embodiment Construction

[0040] The substrate 1 used in step a) of the method according to the invention is for example formed of a substrate made of ceramic, sapphire, enamel or other material and has a domed surface. In a first step a) of the method, a first adhesive layer 2 and a second conductive layer 3 , the layer from which metal electrodeposition can start, are deposited, for example by physical vapor deposition (PVD). Typically, the first adhesive layer 2 is of Ti, Ta, Cr or Th type and has a thickness of 30nm to 80nm, while the second conductive layer 3 is of Au, Pt, Ag, Cr, Pd, TiN, CrN, ZrN, Ni type( Figure 1a ) and also have a thickness of 30 nm to 80 nm. The first adhesive layer and the second conductive layer may be deposited by any other method known to those skilled in the art.

[0041] Alternatively, the substrate can be made of stainless steel or other metal capable of initiating the electroforming reaction. In this case, the first and second layers are no longer needed. In the...

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Abstract

A method for fabricating metal decorations on a domed dial made of insulating material. The method includes a) providing a substrate and depositing a first adhesive layer and a second electrically conductive layer on the substrate through vapor deposition; b) depositing a third adhesive layer; c) applying a photosensitive resin layer; d) irradiating the photosensitive resin layer through a mask limiting the outline of a decoration object; e) dissolving non-irradiated region of the photosensitive resin layer to expose a third layer where the decoration object is in an in-situ manner; f) removing the third adhesive layer where the decoration object is to expose the second electrically conductive layer; g) electrodepositing a metal layer or a metal alloy layer from the electrically conductive surface to form at least one unit substantially reaching the upper surface of the resin layer; h) removing the rest photosensitive resin layer through plasma etching; i) removing the first, second and third layers through at least one time of wet etching. The invention also relates to a domed dial made of insulating material and comprising metal decoration objects.

Description

technical field [0001] The invention relates to a method for the manufacture of metal ornaments by LIGA-type technology. In particular, the invention relates to a method of this type for the manufacture of domed ceramic dials with metal decorations that fit optimally on the dial. The invention also relates to a dial of this type obtained by this method. Background technique [0002] The LIGA technique (Lithographie Galvanik Abformung, Lithographie Galvanik Abformung, Lithographie Galvanik Abformung, Lithographie Galvanik Abformung) developed by W. Ehrfeld at the Karlsruhe Nuclear Research Center in Germany in the 1980s has proven to be beneficial for the fabrication of high-precision metal microstructure. [0003] The principle of LIGA technology is: deposit a layer of photosensitive resin on a conductive substrate or a substrate coated with a conductive layer, use a synchrotron to perform X-ray irradiation through a mask corresponding to the desired microstructure profile...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G04B19/10
CPCC25D1/003C25D5/022C25D5/10G03F7/18G04B19/10G04D3/0069C25D7/005G03F7/0037G04B19/12G04B37/22G04B45/0069B44C1/00C23F1/02G03F7/16G03F7/20
Inventor E·拉福热A·埃梅利B·蒂克西埃P·格罗森巴赫P·维利
Owner THE SWATCH GRP RES & DEVELONMENT LTD