Method for preparing extreme wettability pattern by laser-induced backward transfer

Abstract

The invention provides a method for preparing an extreme wettability pattern by laser-induced backward transfer, and belongs to the technical field of functional materials. The method comprises the steps of firstly utilizing a laser backward transfer technology, enabling a laser beam to penetrate through a transparent receiving substrate material, transferring a metal material to a glass receivingsubstrate, and roughening the surface of the glass in a rapid, green and efficient manner; and further combining low surface energy modification and laser direct writing technology, directly constructing the extreme wettability pattern on a prepared superhydrophobic surface. According to the method, the metal material is rapidly deposited on the glass substrate, the process is simple, convenient,green and environmentally friendly without introducing the substances harmful to the environment, and expensive glass processing equipment and dangerous chemicals are not used; the pattern is directly written by the laser, so that the mask preparation process is avoided, and the patterning preparation efficiency is improved; the method is simple and rapid in process, suitable for large-area preparation, and facilitate the wide popularization of the application of the extreme wettability pattern in mist collection, directional water transportation, microfluidic chips, cell screening and the like.

Description

technical field [0001] The invention is a laser-induced back transfer method for preparing extremely wettability patterns, which can transfer metal materials to glass receiving substrates through laser-induced back transfer technology, combined with low surface energy modification and laser direct writing technology, to achieve The green and efficient preparation of extreme wetting patterns on glass substrates belongs to the field of preparation of functional surface materials. Background technique [0002] Extreme wettability patterns can be applied in mist collection, directional water transport, droplet manipulation, microfluidic chips and cell screening, etc., and have attracted extensive attention from researchers. [0003] CN106334663A discloses a method for constructing a high-precision extreme wettability pattern on an aluminum substrate. This method uses photolithography technology to cover a patterned photoresist on the superhydrophobic surface of the aluminum subs...

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Problems solved by technology

However, this method involves the use of a large number of harmful chemical reagents, which is not conducive to large-scale use and promotion

[0006] In the above research methods, the use of mask technology to prepare extremely wettability patterned surfaces increases the process flow and complexity, and reduces the preparation efficiency; the extensive use of toxic and harmful chemical reagents will cause damage to operators and experimental equipment, and at the same time destroy ecosystem

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