Preparation method of graphene nanoribbons

Abstract

The invention discloses a preparation method of graphene nanoribbons. The method proposes theoretical simulation and an experimental scheme for nanowire arraying manipulated by a probe, and utilizes molecular dynamics simulation to determine a force origin of the probe and plan a path of the probe, so that a nanowire moving direction and moving distance can be manipulated, finally the dispersed nanowires form an array, and a basis is provided for controllable preparation of a nanoribbon structure by using the nanowire array as a shield; and after the nanoribbon structure is obtained by etching, edge defects are further improved by high-temperature annealing to obtain the graphene nanoribbons with atomic-scale smooth edges, and the photoelectric characteristics of the nanoribbons are improved. The method provided by the invention has the advantages of simple operation, high practicability and high reliability, is suitable for actual production, and effectively solves the difficult problem of preparation of graphene nanoribbons.

Description

technical field [0001] The invention belongs to the technical fields of material science, molecular dynamics and micro-nano manufacturing, and in particular relates to a preparation method of graphene nanobelts. Background technique [0002] Graphene nanoribbons inherit many excellent properties of graphene and have energy gaps, so they have greater potential application value in the field of optoelectronics. However, for a long time, the excellent properties of graphene nanoribbons have not been fully utilized due to the lack of high-quality, large-area, and nano-periodic nanoribbon preparation methods with high reliability, strong practicability, and easy operation. Both traditional mechanical exfoliation method and chemical vapor deposition (CVD) method can directly prepare graphene nanoribbons, but the width of nanoribbons prepared by mechanical exfoliation method is difficult to control, and the number and quality of graphene layers prepared by CVD method are difficult ...

AI Technical Summary

Problems solved by technology

However, for a long time, the excellent properties of graphene nanoribbons have not been fully utilized due to the lack of high-quality, large-area, nano-period interval nanoribbon preparation methods with high reliability, strong practicability, and easy operation.

Both the traditional mechanical exfoliation method and the chemical vapor deposition (CVD) method can directly prepare graphene nanoribbons, but the width of the nanoribbons prepared by the mechanical exfoliation method is difficult to control, and the graphene layers and quality prepared by the CVD method are difficult to guarantee.

Although the etching method can prepare graphene nanoribbons with precise positioning, the traditional electron beam lithography using PMMA or ZEP520 as a resist has large resolution limitations; the etching using graphene's own folds as a mask plate, although It can avoid the pollution of impurities and prepare graphene nanoribbons with smaller width, but the process is complicated and the cost is high, so it is not suitable for actual production

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