Preparation method of bismuth quantum dot material growing in mesoporous silica nanoparticles

A mesoporous silica and nanoparticle technology, applied in chemical instruments and methods, nanotechnology, nano-optics, etc., can solve the problems of inability to prepare nanoparticles, complicated preparation process, inability to achieve protection, etc., and achieve low cost and operation. Simple and effective in improving light-to-heat conversion efficiency

Active Publication Date: 2019-11-22
ZHEJIANG UNIV
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Problems solved by technology

[0004] The organic template method is widely used to prepare mesoporous silica, but it has several disadvantages: (1) The preparation process is complicated (2) It is impossible to prepare nanoparticles with a controllable size smaller than 200nm (3) The pore size is mostly smaller than 5nm
However, bismuth is easily oxidized, and the current preparation method cannot achieve effective protection.

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  • Preparation method of bismuth quantum dot material growing in mesoporous silica nanoparticles
  • Preparation method of bismuth quantum dot material growing in mesoporous silica nanoparticles
  • Preparation method of bismuth quantum dot material growing in mesoporous silica nanoparticles

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Embodiment Construction

[0027] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0028] Bismuth quantum dots (Bi@SiO) grown on mesoporous silica nanoparticles provided by the present invention 2 ) preparation method of the material, the mesoporous silica nanoparticles with controllable pore size and particle size are prepared by organic template method, which specifically includes the following steps:

[0029] (1) Weigh 200 mg of cetyltrimethylammonium bromide and dissolve it in 10 ml of deionized water, and magnetically stir until dissolved to obtain the first solution.

[0030] (2) Add 20 ml of ethyl acetate, 5 ml of methanol and 3 ml of ammonia water in sequence to 95 ml of deionized water to obtain a second solution.

[0031] (3) Add the first solution dropwise to the second solution under stirring to obtain the third solution.

[0032] (4) In the stirring state, 0.5 ml tetraethyl orthosilicate was added dropwise to the third ...

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Abstract

The invention discloses a preparation method of a bismuth quantum dot material growing in mesoporous silica nanoparticles, and belongs to the field of nano material preparation research. According tothe method, mesoporous silica is prepared by using an organic template, and bismuth quantum dots are reduced and grown in situ, so that the particle size of the prepared mesoporous silica is about 150nm, the pore diameter is about 10 nm, and the particle size of the bismuth quantum dots is about 1-2 nm. Mesoporous silica prepared has excellent adsorption performance, has a good protection effecton bismuth, improves the photo-thermal conversion efficiency of bismuth, and has a wide application prospect in the fields of electronic devices, sensors, drug carriers and the like. The bismuth quantum dots (Bi@SiO2) grown in the mesoporous silica nanoparticles have excellent photothermal conversion performance and huge potential in the field of tumor photothermal therapy. The preparation methodprovided by the invention is simple in equipment and has the advantages of easiness in control of process conditions, low cost and the like.

Description

technical field [0001] The invention belongs to the technical field of inorganic nanoparticle materials, in particular to a bismuth quantum dot (Bi@SiO2) grown in mesoporous silicon oxide nanoparticles 2 ) The preparation method of the material. Background technique [0002] Porous materials have the advantages of large specific surface area, large pore volume, and low density, and are widely used in the fields of adsorption and separation, catalysis, electrochemistry, biomedicine, optics, and electronic devices. Compared with other porous materials, mesoporous silica has more excellent properties, such as adjustable morphology and size, highly ordered pore structure, uniform distribution of pore size, high porosity and large specific surface area. , surface modification is easy, non-toxic, stable, cheap, etc., making mesoporous silica have good application prospects in the fields of catalysis, sensors, and drug carriers. [0003] When silica is used as a drug carrier, its...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/02C09K11/74B82Y20/00B82Y30/00B82Y40/00
CPCB82Y20/00B82Y30/00B82Y40/00C09K11/025C09K11/74
Inventor 李翔陈彤韩高荣
Owner ZHEJIANG UNIV
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