Polysilicon slag slurry harmless treatment system

A harmless treatment, polysilicon technology, applied in the direction of inorganic chemistry, silicon compounds, sustainable waste treatment, etc., can solve the problems of unfriendly environment, high energy consumption, etc., reduce the difficulty of maintenance, realize closed-circuit circulation, and improve environmental protection Effect
CN110577398APending Publication Date: 2019-12-17新疆戈恩斯能源科技有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
新疆戈恩斯能源科技有限公司
Publication Date
2019-12-17

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Abstract

The application discloses a polysilicon slag slurry harmless treatment system, the polysilicon slag slurry harmless treatment system comprises a filtering device, a storage device and a mixing devicewhich are sequentially communicated through pipelines; the filtering device is used for filtering slag slurry containing silicon powder generated in the polysilicon production process to generate filter residue; the storage device is used for collecting the filter residue generated by the filtering device and obtaining the quality of the filter residue through a weighing module; the mixing deviceis used for processing the filter residue to generate brick-making raw materials when the quality of the filter residue in the storage device is greater than or equal to a preset quality threshold. Byadopting the system, polycrystalline silicon slag slurry can be subjected to harmless treatment, and the polysilicon slag slurry harmless treatment system is more environment-friendly and reduces energy consumption compared with the existing polycrystalline silicon slag slurry treatment system.
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Description

technical field

[0001] The application relates to the field of polysilicon production, and in particular to a harmless treatment system for polysilicon slurry. Background technique

[0002] At present, the world's polysilicon production field mainly uses the Siemens method to produce polysilicon, and the process of producing polysilicon by the Siemens method will inevitably produce a large amount of waste residue, which needs to be treated.

[0003] Domestically, evaporative drying or hydrolysis methods are mostly used to treat waste residues. However, evaporative drying methods consume a lot of energy, and hydrolysis methods are not environmentally friendly, and the processing load of subsequent sewage treatment devices is relatively large, and the operation and maintenance costs are relatively high. In addition, some of the waste residues are treated by drum filtration. However, the content of chlorosilane in the solid waste after drum filtration is still high. Due to the ...

Claims

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