Integrated preparation device of high-flux magnetron sputtering nano film device

A nano-film and preparation device technology, which is applied in the field of integrated preparation devices for high-throughput magnetron sputtering nano-film devices, can solve the problem that the amount of samples processed at one time needs to be increased, and achieve full use of space, uniform coating, and easy The effect of control
CN110777344AActive Publication Date: 2020-02-11纳能镀膜丹阳有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
纳能镀膜丹阳有限公司
Publication Date
2020-02-11

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Abstract

The invention relates to an integrated preparation device of a high-flux magnetron sputtering nano film device. The integrated preparation device of the high-flux magnetron sputtering nano film devicecomprises a main machine, a vacuum air extractor, a power supply and control system and a machine cabinet; the main machine comprises a working chamber, a sample rack, five magnetic control targets and a sample baffle plate; the five magnetic control targets obliquely surround the top of the working chamber to realize co-sputtering or sequential sputtering; each magnetic control target is provided with a target baffle; the target baffle temporarily shields the corresponding magnetic control target through contraction opening and closing; the sample rack is arranged below the magnetic controltargets; the top of the sample rack is provided with a sample cover; the sample cover is provided with a plurality of sample through holes and is used for high-flux preparation of multi-component mixed nano films and nano multilayer functional film devices; and the sample baffle is arranged above the sample cover. According to the design of the magnetic control targets of a coating preparation device, the space inside the working chamber is fully utilized, and the co-sputtering or the sequential sputtering coating can be realized. The sample cover is provided with not less than 100 sample through holes, hundreds of identical samples can be prepared simultaneously in a single time, and the possibility is provided for high-flux coating of a material genome.
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Description

technical field

[0001] The invention belongs to the technical field of magnetron sputtering coating, and in particular relates to an integrated preparation device for high-throughput magnetron sputtering nanometer thin film devices. Background technique

[0002] Magnetron sputtering is a kind of physical vapor deposition (Physical Vapor Deposition, PVD). Magnetron sputtering coating technology is an important film preparation method, which can prepare metal, semiconductor, insulator and other multi-material films on the carrier. , has the advantages of simple equipment, easy control, large coating area and strong adhesion. Magnetron sputtering introduces a magnetic field on the surface of the target cathode, and uses the magnetic field to confine charged particles to increase the plasma density to increase the sputtering rate.

[0003] Patent CN201110358232.0 provides a magnetron sputtering system, including magnetron chamber, substrate turntable, substrate turntable drive ...

Claims

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