Negative hydrogen ion extraction device

An extraction device and a technology for negative hydrogen ions, which are applied in the field of ion sources, can solve the problems of poor beam quality, difficult to filter out electrons, low beam intensity, etc., achieve simple and convenient assembly, improve beam purity, and improve beam intensity Effect

Inactive Publication Date: 2020-03-06
THE ENG & TECHN COLLEGE OF CHENGDU UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The technical problem to be solved and the technical task proposed by the present invention are to improve the prior art, provide a negative hydrogen ion extracting device, solve the problem that the extracting device in the current technology efficiently extracts negative hydrogen ions, it is difficult to effectively filter out electrons, and the beam Problems with low current intensity and poor beam quality

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Embodiment Construction

[0020] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] A device for extracting negative hydrogen ions disclosed in an embodiment of the present invention can efficiently extract negative hydrogen ions from discharge plasma, effectively filter electrons, and meet the requirements of accelerators for negative hydrogen ion beams.

[0022] Such as Figure 1 to Figure 3 As shown, a device for extracting negative hydrogen ions mainly includes an electric field component and a first grid 1, a second grid 2 and a t...

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Abstract

The invention discloses a negative hydrogen ion extraction device. The device comprises an electric field assembly and a first gate, a second gate and a third gate which are sequentially arranged in an insulated and spaced way. The first gate, the second gate and the third gate are provided with through holes along the overlapping direction of the three gates and along the same axis direction; thesecond gate is provided with an annular magnet surrounding the through hole of the second grid; the electric field assembly comprises a first voltage assembly loaded between the first gate and a plasma discharge chamber, a second voltage assembly loaded between the second gate and the first gate and a third voltage assembly loaded between the third gate and the second gate. The first voltage assembly, the second voltage assembly and the third voltage assembly enable the potentials of the plasma discharge chamber, the first gate, the second gate and the third gate to be sequentially increasedto form a multi-stage electric field. Negative hydrogen ions and electrons generated in the plasma discharge chamber are led out by adopting the multi-stage electric field, and electron constraints are filtered by utilizing the magnetic field so that the beam intensity of the obtained negative hydrogen ions is effectively improved, the beam purity is improved and the beam quality is improved.

Description

technical field [0001] The invention relates to the technical field of ion sources, in particular to a device for extracting negative hydrogen ions. Background technique [0002] The ion source is a device that ionizes neutral atoms or molecules and extracts an ion beam from it. It is various types of ion accelerators, mass spectrometers, electromagnetic isotope separators, ion implanters, ion beam etching devices, ion thrusters and An indispensable part of equipment such as neutral beam injectors in controlled fusion devices. One of the main factors restricting the development of high-current proton cyclotrons is the beam intensity and beam quality, and the extraction device is the key to increasing the beam intensity and improving the beam quality. The beam drawn from the plasma in the discharge chamber is mainly composed of negative hydrogen ions and electrons, and the intensity of the electron beam is usually several to tens of times, or even hundreds of times, the inte...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H13/02
CPCH05H13/02
Inventor 赵杰许丽王世庆柳建李建郑才国王坤桂兵仪
Owner THE ENG & TECHN COLLEGE OF CHENGDU UNIV OF TECH
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