Semiconductor or photovoltaic material processing device

Abstract

A semiconductor or photovoltaic material processing device comprises an ark structure and a semiconductor or photovoltaic material processing structure, wherein the ark structure is placed on the semiconductor or photovoltaic material processing structure, and an electrode structure of the semiconductor or photovoltaic material processing structure is connected with an electrode column of the arkstructure; the processing structure of the semiconductor or photovoltaic material comprises a furnace body and a furnace door, an electrode structure is arranged on the furnace door, an adjusting device is arranged on the furnace door, the adjusting device comprises an arc-shaped contact surface and a supporting block, the arc-shaped contact surface is arranged between the supporting block and thefurnace door, and a structure matched with the arc-shaped contact surface is arranged at the corresponding position of the supporting block or the furnace door; the semiconductor or photovoltaic material processing device provided by the invention is simple in structure and reasonable in electrode mechanism design, is perfectly combined with the furnace door to realize longitudinal placement of the ark sheet, and can quickly adjust the furnace door to achieve a good sealing effect.

Description

technical field [0001] The invention relates to the field of semiconductor or photovoltaic material processing, more specifically, it relates to a semiconductor or photovoltaic material processing device. Background technique [0002] Semiconductor or photovoltaic materials are widely used in electronics, new energy and other industries. Semiconductor and photovoltaic materials usually require chemical treatment before they can be applied to products. CVD technology is one of the processing methods. CVD is chemical vapor deposition. CVD technology is currently It has been widely used in the processing of semiconductor or photovoltaic materials. Common processing equipment includes PECVD, LPCVD, APCVD, etc. In addition to CVD, there are also diffusion processes, such as phosphorus diffusion, boron diffusion, etc., which can use gas diffusion to treat raw materials. Processing. At present, there are many related equipment in the industry. The corresponding equipment can be sel...

AI Technical Summary

Problems solved by technology

[0003] The following problems exist in the current equipment: the graphite ark is usually large in size, generally reaching about 2 meters, and the electric field will have a large difference from the tail to the front of the entire graphite ark, and it is difficult to obtain a uniform electric field

Since the silicon wafer needs to be placed vertically, the surface of the silicon wafer will not be tightly bonded to the surface of the boat board, which will lead to poor electrical conductivity of the silicon wafer. The risk of rewinding, resulting in an increase in the rate of defective products

The overall production capacity of the equipment is still low

[0004] Moreover, the furnace door of the corresponding existing equipment is sealed by the way that the sealing plate is in contact with the furnace frame, and the sealing plate is a buckle type, that is, the sealing plate passes through The buckle is fixed on the furnace door. When the furnace door is not tightly sealed, the operator pushes the sealing plate forward to seal by tapping the buckle. However, after a long period of use, the position where the sealing plate contacts the furnace frame is severely worn. When the furnace door and the furnace frame are sealed by the sealing plate, the seal will not be tight, which will cause smoke from the furnace door, affect the environmental sanitation, and also have a serious impact on the economic and social benefits of the enterprise

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