Method for preparing anti-corrosion pure Ti film through DC magnetron sputtering
A DC magnetron sputtering and DC sputtering technology, which is applied in sputtering coating, ion implantation coating, metal material coating process, etc., can solve the problems of easy aging of protective paint, large environmental pollution, high maintenance cost, etc. Achieve good corrosion resistance, no environmental pollution, process controllable effect
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Embodiment 1
[0032] Using stainless steel as a substrate, the preparation of a corrosion-resistant pure titanium film on its surface by DC magnetron sputtering includes the following steps:
[0033] (1) Surface treatment of base material
[0034] A. Use acetone to wipe the surface of the substrate to remove surface oil;
[0035] B. Put the wiped substrate into ultrasonic cleaning equipment added with analytical pure alcohol and deionized water, and use ultrasonic cleaning to clean the substrate, wherein the volume ratio of analytical pure alcohol to deionized water is 1:9, the water temperature is 37°C, and the working frequency 29KHZ, cleaning time 0.5h;
[0036] C. Put the substrate into the ultrasonic cleaning equipment filled with deionized water again to remove the stains attached to the surface of the substrate. The water temperature is 51°C, the working frequency is 34KHZ, and the cleaning time is 0.5h;
[0037] D. After the substrate is cleaned, put it into the dryer to dry the s...
Embodiment 2
[0050] Using ordinary steel material as the substrate, the preparation of corrosion-resistant pure titanium film on its surface by DC magnetron sputtering includes the following steps:
[0051] (1) Surface treatment of base material
[0052] A. Use acetone to wipe the surface of the substrate to remove surface oil;
[0053] B. Put the wiped substrate into the ultrasonic cleaning equipment added with analytical pure alcohol and deionized water, and use ultrasonic cleaning to clean the substrate, wherein the volume ratio of analytical pure alcohol to deionized water is 1:9, the water temperature is 40°C, and the working frequency 25KHZ, cleaning time 0.5h;
[0054] C. Put the substrate into the ultrasonic cleaning equipment filled with deionized water again, the water temperature is 55°C, the working frequency is 35KHZ, and the cleaning time is 0.5h;
[0055] D. After the substrate is cleaned, put it into the dryer to dry the surface moisture.
[0056] (2) The substrate is pl...
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