Method of reducing friction coefficient of coating through micro sand blasting after-treatment

Abstract

The invention discloses a method of reducing the friction coefficient of a coating through micro sand blasting after-treatment. In order to achieve the purposes that the problem that large particles exist on the surface of the arc ion plating coating is solved, and the friction coefficient of the coating is reduced, an oxide coating with the small thickness is deposited on the surface of a substrate which is covered with the coating, the feature that amorphous crystal grains of the oxide coating are small is utilized to overcome the defect that the surface of the coating is uneven, then the large particles which are caused by arc ion plating and exist on the surface of the coating are removed through micro sand blasting after-treatment, and therefore the surface can be flat and smooth, andthe friction coefficient of the coating is reduced. Sand grains continuously impact on the surface of the coating in the micro sand blasting after-treatment process, and the pressure stress can be effectively improved. Meanwhile, the existence of the oxide can have an effect that the impact force borne by the main coating of the substrate is buffered, and the damage of the coating is reduced. A compact oxide film is formed by the oxide at the high temperature, specifically, the oxide remains on the surface of the coating after sand blasting operation is accomplished, the diffusion of elementsand the heat can be avoided, the wear of the coating is reduced, and the service life of the coating substrate is remarkably prolonged.

Description

technical field

[0001] The invention relates to coating surface treatment technology, in particular to a method for reducing coating friction coefficient by micro-sand blasting post-treatment. Background technique

[0002] Arc ion plating is to initiate arc discharge between the cathode made of evaporated material and the anode formed in the vacuum chamber under vacuum conditions. The arc discharge evaporates the target material and deposits it on the surface of the substrate to form a film. Arc discharge will form an arc spot that moves irregularly on the surface of the cathode. The high-energy, high-density current carried by the arc spot can directly promote the transformation of the target material at the arc spot from a solid phase to a metal vapor plasma. The metal plasma is used for Depositing thin films, one is that the bombardment, implantation and deposition process of ions in the deposition process can activate the surface of the substrate and enhance the surface ...

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