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End concentricity assembling and adjusting mechanism and adjusting method thereof

A technology for adjusting mechanism and concentricity, applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as high concentricity requirements, inability to accurately locate, time-consuming and labor-intensive, etc., to improve production efficiency, reduce production costs, adjust convenient effect

Inactive Publication Date: 2020-05-08
SOLERAS ADVANCED COATINGS (JIANGYIN) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Different film systems (such as superhard, wear-resistant, anti-corrosion alloy films, etc.) can be obtained by changing different targets (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.); , usually erected between the end and the support end, so the concentricity between the end head and the support end is required to be high, while the traditional adjustment of the concentricity between the end head and the support end is manually adjusted, which cannot be accurately positioned, and the error Larger, it often needs to be adjusted back and forth many times, which is time-consuming and laborious, and is extremely inconvenient. In order to confirm and adjust the concentricity conveniently and intuitively, this adjustment mechanism is specially designed and developed.

Method used

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  • End concentricity assembling and adjusting mechanism and adjusting method thereof
  • End concentricity assembling and adjusting mechanism and adjusting method thereof
  • End concentricity assembling and adjusting mechanism and adjusting method thereof

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Embodiment Construction

[0030] see Figure 1-10 , a terminal concentricity assembly adjustment mechanism related to the present invention includes a base 1, a terminal 2, a laser emitting device 3, a support frame 4, a target plate 5 and a clamp 6; the top surface of the base 1 is provided with a terminal The head 2 and the support frame 4, the end head 2 and the support frame 4 are arranged opposite and on the same straight line, the target is assembled between the end head 2 and the support frame 4; the laser emitting device 3 is fixedly connected by a clamp 6 On the end 2, the target disk 5 is arranged on the support frame 4, the above-mentioned laser emitting device 3 is arranged opposite to the target disk 5, and the laser spot emitted by the laser emitting device 3 falls on the target disk 5;

[0031] The laser emitting device 3 includes a housing 3.1, the housing 3.1 has a bowl-shaped structure, and a flange is provided at the edge of the outer wall of the opening end of the housing 3.1, and t...

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PUM

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Abstract

The invention relates to an end concentricity assembling and adjusting mechanism and an adjusting method thereof. The end concentricity assembling and adjusting mechanism comprises a base (1), an end(2), a laser emitting device (3), a supporting frame (4), a target disc (5) and a hoop (6). The top surface of the base (1) is provided with an end head (2) and a support frame (4), and the end head (2) and the support frame (4) are oppositely arranged and are positioned on the same straight line; the laser emitting device (3) is fixedly connected to the end (2) through a hoop (6), the target disc(5) is arranged on the supporting frame (4), and the laser emitting device (3) and the target disc (5) are oppositely arranged. According to the end concentricity assembly adjusting mechanism and theadjusting method thereof, the structure is simple, adjustment is convenient, the precision is high, errors are small, time and labor are saved, the production efficiency is improved, and the production cost is reduced.

Description

technical field [0001] The invention relates to a terminal concentricity assembly adjustment mechanism and an adjustment method thereof, which belong to the technical field of target material production and manufacturing. Background technique [0002] The coating target is a sputtering source that forms various functional thin films on the substrate by sputtering under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating systems. To put it simply, the target is the target material bombarded by high-speed energetic particles. It is used in high-energy laser weapons. When lasers with different power densities, different output waveforms, and different wavelengths interact with different targets, they will produce different damages. effect. For example: evaporative magnetron sputtering coating is heating evaporation coating, aluminum film, etc. Different film systems (such as superhard, wear-resistant, anti-corrosion all...

Claims

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Application Information

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IPC IPC(8): G01B11/27
CPCG01B11/27
Inventor 伊凡蔺裕平蒋宏翔
Owner SOLERAS ADVANCED COATINGS (JIANGYIN) CO LTD
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