Semiconductor light emitting element having electron blocking capability

A light-emitting element and electron blocking technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems affecting the luminous efficiency of light-emitting diodes, and achieve the effect of improving luminous efficiency

Inactive Publication Date: 2020-06-23
XIAN ZHISHENG RUIXIN SEMICON TECH CO LTD
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Problems solved by technology

[0004] However, because the mobility of electrons is much higher than that of holes, the electrons generated by the N-type semiconductor layer can quickly enter the quantum well light-emitting layer, and the excess electrons will jump from the quantum well light-emitting layer to the P-type semiconductor layer, so that the electrons Non-radiative recombination with holes affects the luminous efficiency of light-emitting diodes

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  • Semiconductor light emitting element having electron blocking capability

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Embodiment Construction

[0026] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0027] See figure 1 , figure 1 A schematic structural diagram of a semiconductor light-emitting element with electron blocking capability provided by an embodiment of the present invention. An embodiment of the present invention provides a semiconductor light-emitting element with electron blocking capability, the semiconductor light-emitting element comprising:

[0028] substrate layer 11;

[0029] Specifically, the material of the substrate layer 11 may be sapphire, silicon, silicon carbide, zinc oxide, gallium nitride, aluminum nitride or other materials suitable for crystal epitaxial growth.

[0030] The buffer layer 12 is located on the substrate layer 11;

[0031] Further, the material of the buffer layer 12 is GaN.

[0032]...

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Abstract

The invention relates to a semiconductor light emitting element having an electron blocking capability, which comprises a substrate layer, a buffer layer located on the substrate layer, an N-type semiconductor layer located on the buffer layer, an N-type doped layer located on the N-type semiconductor layer, a quantum well light-emitting layer located on the N-type doped layer, an electron blocking layer located on the quantum well light-emitting layer, a P-type doped layer located on the electron blocking layer and a P-type semiconductor layer located on the P-type doped layer, wherein the electron blocking layer comprises a first electron blocking layer, a second electron blocking layer and a third electron blocking layer which are sequentially laminated on the quantum well light-emitting layer. According to the invention, the first electron blocking layer, the second electron blocking layer and the third electron blocking layer are sequentially laminated on the quantum well light-emitting layer, so that excessive electrons can be effectively prevented from jumping to the P-type semiconductor layer from the quantum well light-emitting layer, and the light-emitting efficiency of the light-emitting diode is improved.

Description

technical field [0001] The invention relates to the technical field of light-emitting elements, in particular to a semiconductor light-emitting element with electron blocking capability. Background technique [0002] A light emitting diode (LED, Light Emitting Diode) is a compound semiconductor light emitting element that converts electrical energy into light energy. Here, the composition ratio of compound semiconductors can be adjusted to realize various colors. Recently, low voltage / high power driving devices have become popular in the LED backlight unit market. [0003] At present, a light-emitting diode generally includes a substrate layer, a buffer layer, an N-type semiconductor layer, a multi-quantum well light-emitting layer, and a P-type semiconductor layer. Among them, the N-type semiconductor layer is used to provide electrons; the P-type semiconductor layer is used to provide holes. When a current passes through, the electrons provided by the N-type semiconducto...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/06H01L33/14
CPCH01L33/06H01L33/145
Inventor 李建华李全杰刘向英
Owner XIAN ZHISHENG RUIXIN SEMICON TECH CO LTD
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