Hybrid perovskite-based write-once read-many memory and preparation method thereof
A multi-read, perovskite technology, applied in semiconductor/solid-state device manufacturing, electrical solid-state devices, semiconductor devices, etc. Problems such as high voltage, to achieve the effect of simple preparation method, simplified process flow and low misreading rate
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Embodiment 1
[0044] (1) cleaning ITO
[0045] Sonicate the ITO conductive glass in deionized water, acetone, and alcohol for 30 minutes, and then irradiate the ITO surface with ultraviolet light for 20 minutes in a UV cleaner;
[0046] (2) Configure the perovskite precursor solution
[0047] Weigh 0.229g of lead bromide and 0.070g of methylamine bromide according to the molar ratio of 1:1, mix and dissolve in 1mL of methylamine acetate solution, and then stir at 60°C for 2 hours to prepare perovskite with a concentration of 300mg / mL Ore precursor solution;
[0048] (3) Preparation of perovskite thin films
[0049] In an air environment, heat the ITO substrate in step (1) to 90°C, use a pipette gun to measure the perovskite precursor solution in step (2) and spin-coat it on the ITO surface, and set the speed of the spin coater to 4000rpm , the time is 20s, and then annealed at 100°C for 5min to obtain a dense perovskite active layer with a thickness of 300nm, and its surface morphology i...
Embodiment 2
[0055] (1) cleaning ITO
[0056] Sonicate the ITO conductive glass in deionized water, acetone, and alcohol for 30 minutes, and then irradiate the ITO surface with ultraviolet light for 15 minutes in a UV cleaner;
[0057] (2) Configure the perovskite precursor solution
[0058] Weigh 0.229g of lead bromide and 0.070g of methylamine bromide according to the molar ratio of 1:1, mix and dissolve in 1mL of methylamine acetate solution, and then stir at 60°C for 2 hours to prepare perovskite with a concentration of 300mg / mL Ore precursor solution;
[0059] (3) Preparation of perovskite thin films
[0060] In an air environment, heat the ITO substrate in step (1) to 100°C, use a pipette gun to measure the perovskite precursor solution in step (2) and spin-coat it on the ITO surface, and set the speed of the spin coater to 4000rpm , the time is 20s, and then annealed at 100°C for 5min to obtain a dense perovskite active layer with a thickness of 300nm;
[0061] (4) Prepare the t...
Embodiment 3
[0066] (1) cleaning ITO
[0067] Sonicate the ITO conductive glass in deionized water, acetone, and alcohol for 30 minutes, and then irradiate the ITO surface with ultraviolet light for 20 minutes in a UV cleaner;
[0068] (2) Configure the perovskite precursor solution
[0069] Weigh 0.229g of lead bromide and 0.070g of methylamine bromide according to the molar ratio of 1:1, mix and dissolve in 1mL of methylamine acetate solution, and then stir at 60°C for 2 hours to prepare perovskite with a concentration of 300mg / mL Ore precursor solution;
[0070] (3) Preparation of perovskite thin films
[0071] In an air environment, heat the ITO substrate in step (1) to 90°C, use a pipette gun to measure the perovskite precursor solution in step (2) and spin-coat it on the ITO surface, and set the speed of the spin coater to 3000rpm , the time is 20s, and then annealed at 90°C for 5min to obtain a dense perovskite active layer with a thickness of 350nm;
[0072] (4) Prepare the top...
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