Plasma device and method for decomposing hydrogen sulfide
A plasma and hydrogen sulfide technology, applied in the field of plasma chemistry, can solve the problems of low hydrogen sulfide conversion rate and high energy consumption for decomposition
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Embodiment 1
[0107] use figure 1 The shown low-temperature plasma reaction equipment performs hydrogen sulfide decomposition reaction. The specific structure and structural parameters of the low-temperature plasma reaction equipment are as follows. The internal electrode of this embodiment is a high-voltage electrode:
[0108] Reaction equipment includes:
[0109] A first cavity, the first cavity is respectively provided with a first inlet, a gas product outlet and a liquid product outlet, wherein all the side walls of the first cavity are formed by a barrier medium, forming the barrier medium The material is hard glass;
[0110] a second cavity, the second cavity is nested inside the first cavity, and the second cavity is respectively provided with a second inlet and a second outlet;
[0111] an internal electrode, the internal electrode forms the side wall of the second cavity, the material forming the internal electrode is stainless steel, and the internal electrode is connected to a ...
Embodiment 2
[0138] The present embodiment adopts the plasma reaction equipment similar to embodiment 1 to carry out the decomposition reaction of hydrogen sulfide, the difference is, in the present embodiment:
[0139] The side wall of the first cavity is used as an external electrode, and the external electrode is connected to a high-voltage power supply, so that the side wall of the first cavity is used as a high-voltage electrode, and the material forming the external electrode is stainless steel metal foil; and the second The side walls of the second cavity are grounded as internal electrodes, so that the side walls of the second cavity are used as ground electrodes.
[0140] The barrier medium is arranged around the inner wall of the first cavity;
[0141] L 2 with the thickness of the barrier dielectric D 1 ratio of 6:1; and H 1 :L 3 =1:46.
[0142] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reaction equipment from the first inlet. ...
Embodiment 3
[0146] The present embodiment adopts the plasma reaction equipment similar to embodiment 1 to carry out the decomposition reaction of hydrogen sulfide, the difference is, in the present embodiment:
[0147] All side walls of the first cavity are formed by external electrodes, the material forming the external electrodes is copper foil, the external electrodes are grounded, and the internal electrodes are connected to a high-voltage power supply;
[0148] The barrier medium is arranged around the inner wall of the first cavity;
[0149] L 2 with the thickness of the barrier dielectric D 1 The ratio of 0.5:1; and H 1 :L 3 =1:200.
[0150] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reaction equipment from the first inlet. 2 S / Ar mixed gas, where H 2 The volume fraction of S is 25%, the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge area is 3.4s, and the reaction pressure in...
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