A chemical mechanical polishing solution and its application
A chemical-mechanical, polishing liquid technology, applied in polishing compositions containing abrasives, electrical components, circuits, etc., can solve the problem of lack of polishing rate selectivity, etc., and achieve the effect of good removal
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[0019] The advantages of the present invention are further described below through specific examples, but the protection scope of the present invention is not limited to the following examples.
[0020] Table 1 shows the composition and content of the polishing liquids of Examples 1-10 and Comparative Examples 1-5 of the present invention. According to this table, the polishing liquids of the examples and comparative examples were prepared, the components were mixed uniformly, the mass percentage was made up to 100% with water, and the pH was adjusted to the corresponding value with a pH regulator to obtain the polishing liquids of the embodiments and comparative examples of the present invention.
[0021] Table 1 Compositions of polishing liquids of Examples 1-10 of the present invention and Comparative Examples 1-5
[0022]
[0023]
[0024] 8-inch polycrystalline silicon wafers containing silicon nitride and silicon dioxide were polished with the chemical mechanical p...
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