Process for making silicon tetrachloride

A technology of silicon tetrachloride and chlorosilane, applied in the direction of silicon halide compounds, etc., can solve the problems of insufficient conversion rate of silicon tetrachloride and expensive fractionation of silicon tetrachloride

Inactive Publication Date: 2003-07-16
TOKUYAMA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, since these methods use a two-stage reaction of producing silicon tetrachloride from metallic silicon and hydrogen chloride through chlorosilanes, large-scale production steps (equipment) are ne

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Fill a quartz glass tube reactor with an inner diameter of 4 mm with a mixture of 1 g of silicon metal (containing 0.15% by weight of iron, 0.06% by weight of aluminum and 0.05% by weight of calcium) and 1 mg of red phosphorus (powder) , kept at 350°C. The gaseous mixture of hydrogen chloride gas and hydrogen was then continuously fed into the reactor with various gaseous components at a rate of 20 ml / min (the superficial velocity of the reaction tower was 2.6 cm / s). The gas composition of the reactor outlet is analyzed by means of gas chromatography, and the conversion ratio of the reaction and the ratio of silicon tetrachloride (such as trichlorosilane, silicon tetrachloride, etc.) as selectivity to silicon tetrachloride). Within 15 minutes of starting to supply the gaseous mixture of hydrogen chloride and hydrogen to the reactor, the reaction reached a state in which the conversion of the reactants and the selectivity to silicon tetrachloride were substantially unch...

Embodiment 2-14

[0031] Substitute the red phosphorus that adds in the silicon metal that various components shown in table 1 are used in embodiment 1, the amount of various components shown in table 1 is by the ratio with silicon metal (by metal element, VIII group metal or other added metal weight %). In addition, the catalytic reaction of silicon metal and hydrogen chloride was carried out in the same manner as in Example 1 in all experiments. The results are also presented in Table 1.

[0032] added components

[0033] Carry out the catalytic reaction of silicon metal and hydrogen chloride in the same manner as in Example 1, just replace the silicon metal (containing 0.15% (weight) of iron, 0.06 % (weight) of aluminum and 0.05% (weight) of calcium), adding various components determined in Table 2, mixed with silicon metal, the amount of various components (by metal elements, VIII metals or other added Metal weight %) is shown in Table 2. The results are also shown in Table 2...

Embodiment 35-48

[0038] A quartz glass tubular reactor with an inner diameter of 4 mm was filled with a mixture of 1 g of quartz sand (grain size: 0.2-08 mm) and 100 mg of ferric chloride and 10 mg of red phosphorus, which was added as a catalytic component, and then kept at 300°C. The reaction gas generated by mixing 10 ml / min of trichlorosilane gas, 15 ml / min of hydrogen chloride gas and 20 ml / min of hydrogen (as carrier gas) is continuously fed into the reactor (the superficial velocity of the reaction tower: 1.3 cm / sec). The composition of the reactor outlet gas was analyzed by means of gas chromatography, and the conversion of trichlorosilane to silicon tetrachloride was calculated during the reaction. The reaction approximately reached a steady state within 5 minutes of starting the supply of the gaseous mixture of hydrogen chloride and hydrogen to the reactor. The conversion values ​​determined after the reaction reached steady state are shown in Table 4. Examples 35-48, Comparative ...

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Abstract

The present invention provides a way to obtain SiCl4 with high activity and selectivity by allowing metal Si or a chlorosilane having HSi bond in the molecule to react with HCl in the coexistence of a specific metal and a specific single substance of an element. Metal Si or a chlorosilane having HSi bond in the molecule and HCl are react with each other in the coexistence of one or more metals of group VIII elements in periodic table and one or more single substances of group VB elements of the 3rd and succeeding period.

Description

technical field [0001] The present invention relates to a method for the manufacture of silicon tetrachloride. More specifically, the present invention relates to the highly selective production of silicon tetrachloride by reacting silicon metal or chlorosilanes having at least one HSi bond in the molecule with hydrogen chloride. Background technique [0002] It has been found that silicon tetrachloride is increasingly used as one of the raw materials for the manufacture of semiconductors (such as high-purity silicon for the growth of silicon wafers, etc.), or for the manufacture of optical fibers, synthetic quartz, finely divided silicon, nitride Raw materials such as silicon. Therefore, the production method of silicon tetrachloride, which is a basic chemical raw material, is also industrially important. [0003] A known method for preparing silicon tetrachloride involves preparing polysilicon raw material, trichlorosilane (silicon trichloride), from metallic silicon and...

Claims

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Application Information

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IPC IPC(8): C01B33/08
Inventor 坂田勘治弘田贤次见神一郎
Owner TOKUYAMA CORP
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