Bump packaging structure and manufacturing method of bump package structure
A technology of packaging structure and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve problems such as product performance degradation and failure, and achieve improved bonding force, increased volume, and avoid hidden solder joints. The effect of cracking or even failure
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no. 1 example
[0054] Please refer to figure 1, this embodiment provides a bump packaging structure 100, which can improve the overall structural strength and connection strength, and avoid the problem that the stress caused by the mismatch of the thermal expansion coefficient acts on the chip soldering point and causes the soldering point to crack or even fail. And can effectively protect the structure from water vapor, ion pollution, radiation or adverse environmental intrusion.
[0055] The bump packaging structure 100 provided in this embodiment includes a base 110, a first conductive bump 130 disposed on the base 110, a second conductive bump 150 disposed on the first conductive bump 130, and a second conductive bump 150 disposed on the second conductive bump. The solder ball 170 on the bump 150; wherein, the width L2 of the second conductive bump 150 is greater than the width L1 of the first conductive bump 130; a groove 151 is opened on the second conductive bump 150, and the solder b...
no. 2 example
[0072] see figure 2 , the present embodiment provides a method for manufacturing the bump packaging structure 100, which is used to manufacture the bump packaging structure 100 as provided in the first embodiment, the method includes:
[0073] S1: forming a first conductive bump 130 on the substrate 110 .
[0074] Specifically, a protective layer 190 is coated on the surface of the substrate 110, and a metal pad 191 is opened by a photolithography process, and then a metal layer 180 is formed by a sputtering process, and a capping layer 131 is coated on the metal layer 180, and formed by a photolithography process. The bump opening 133 , the copper layer is electroplated in the bump opening 133 to form the first conductive bump 130 .
[0075] Specifically, first take a substrate 110, coat the protective layer 190 (passivation) on the surface of the substrate 110, use a photolithography process (exposure / development / baking) to open the metal pad 191, and then use a sputtering...
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