Light-emitting diode with hole injection structure electron blocking layer
A technology of light-emitting diodes and hole injection layers, applied in circuits, electrical components, semiconductor devices, etc., can solve the problems of low carrier recombination efficiency and luminous efficiency, reduced hole injection efficiency, and reduced LED luminous efficiency, etc., to achieve Effects of improving vertical migration ability, suppressing leakage, and improving hole injection efficiency
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[0027] Such as figure 1 , a light-emitting diode with a hole injection structure electron blocking layer of the present invention, comprising: a sapphire substrate 101, a GaN buffer layer 102, an n-type GaN layer 103, a GaN / In 0.3 Ga 0.7 N multi-quantum well active region 104, hole injection structure electron blocking layer 105, p-type GaN layer 106, transparent conductive layer 107, also includes the n-type ohmic electrode 108 that is arranged on the n-type GaN layer 103, and is arranged on the transparent A p-type ohmic electrode 109 on the conductive layer 107 .
[0028] The thickness of the GaN buffer layer 102 is 30 nm; the thickness of the n-type GaN layer 103 is 3 μm; GaN / In 0.2 Ga 0.8 The N multi-quantum well active region 104 has 8 pairs of quantum wells, In 0.2 Ga 0.8 The well thickness of the N quantum well is 3nm, and the thickness of the GaN barrier is 10nm; the total thickness of the electron blocking layer of the hole injection structure is 45nm; the thic...
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