Sense-Switch type pFLASH unit structure with high power and low electric leakage
A unit structure, low leakage technology, applied in the direction of electrical components, circuits, electric solid state devices, etc., can solve the problems of low output power, static leakage, etc.
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[0036] The present invention provides a high-power, low-leakage Sense-Switch type pFLASH unit structure, the circuit diagram of which is as follows figure 1 As shown, it includes a programming / erasing transistor T1 and a signal transmission transistor T2 with a common floating gate FG and a common control gate CG with the programming / erasing transistor T1, and the programming / erasing transistor T1 and the signal transmission transistor T2 All fabricated on p-type Si substrate.
[0037] Such as figure 2 Shown is a schematic diagram of the formation of the active region of the Sense-Switch type pFLASH unit structure, a deep N well 2 is arranged on the upper part of the substrate 1, and the junction depth of the deep N well 2 is 3-7 μm. Both the active region 21 of the program / erase transistor T1 and the active region 22 of the signal transmission transistor T2 are fabricated in the deep N well 2, and STI 31, STI 32 and STI 33, the STI 32 is used to isolate the active region 2...
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