TiO2 scattering film material subjected to polymer planarization treatment and preparation method and application of TiO2 scattering film material
A polymer, planarization technology, used in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as device short-circuit, affect device stability, and increase the surface roughness of scattering films to improve performance, The effect of low manufacturing cost and improved light extraction efficiency
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Embodiment 1
[0033] This embodiment prepares the TiO of polymer planarization treatment 2 Scattering thin film material, and apply it to prepare green FOLED.
[0034] Utilize toluene to dissolve polymethyl methacrylate, and the concentration of the prepared polymer solution is 100mg ml -1 , then 200nm TiO 2 The nanoparticles are dispersed in the polymer solution, in which TiO 2 The concentration ratio of nanoparticles is 0.25wt%;
[0035] Choose polyethylene terephthalate as the substrate, ultrasonically treat the substrate in acetone, ethanol, and deionized water for 15 minutes, blow dry with nitrogen, and place it in an oven at 120°C for drying; after cleaning, polyethylene terephthalate A layer of TiO was spin-coated on the surface of the ester substrate 2 Scattering film, set the rotation speed to 2000rpm, spin time to 60s, and then solidify the film at 120°C for 30min, the prepared TiO 2 The thickness of the scattering film is 0.9 μm; then the polymer solution is spin-coated on T...
Embodiment 2
[0037] This embodiment prepares the TiO of polymer planarization treatment 2 Scattering thin film material, and apply it to prepare green FOLED.
[0038]Utilize toluene to dissolve polymethyl methacrylate, and the concentration of the prepared polymer solution is 100mg ml -1 , then 200nm TiO 2 The nanoparticles are dispersed in the polymer solution, in which TiO 2 The concentration ratio of nanoparticles is 0.50wt%;
[0039] Choose polyethylene terephthalate as the substrate, ultrasonically treat the substrate in acetone, ethanol, and deionized water for 15 minutes, blow dry with nitrogen, and place it in an oven at 120°C for drying; after cleaning, polyethylene terephthalate A layer of TiO was spin-coated on the surface of the ester substrate 2 Scattering film, set the rotation speed to 2000rpm, spin time to 60s, and then solidify the film at 120°C for 30min, the prepared TiO 2 The thickness of the scattering film is 0.9 μm; then the polymer solution is spin-coated on Ti...
Embodiment 3
[0041] This embodiment prepares the TiO of polymer planarization treatment 2 Scattering thin film material, and apply it to prepare green FOLED.
[0042] Utilize toluene to dissolve polymethyl methacrylate, and the concentration of the prepared polymer solution is 100mg ml -1 , then 200nm TiO 2 The nanoparticles are dispersed in the polymer solution, in which TiO 2 The concentration ratio of nanoparticles is 0.75wt%;
[0043] Choose polyethylene terephthalate as the substrate, ultrasonically treat the substrate in acetone, ethanol, and deionized water for 15 minutes, blow dry with nitrogen, and place it in an oven at 120°C for drying; after cleaning, polyethylene terephthalate A layer of TiO was spin-coated on the surface of the ester substrate 2 Scattering film, set the rotation speed to 2000rpm, spin time to 60s, and then solidify the film at 120°C for 30min, the prepared TiO 2 The thickness of the scattering film is 0.9 μm; then the polymer solution is spin-coated on T...
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Abstract
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