Oxidation method for removing antibiotic resistance genes and resistant bacteria in sewage

A technology for antibiotic resistance and sewage, applied in chemical instruments and methods, light water/sewage treatment, oxidized water/sewage treatment, etc., can solve problems such as failure to achieve good results, ineffective removal, and environmental pollution

Pending Publication Date: 2020-10-20
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the advanced treatment process, disinfection technologies such as chlorination, UV, and ozone have the ability to damage bacterial cells and intracellular DNA, kill antibiotic resistant bacteria (antibiotic resistant bacteria, ARB) and destroy antibiotic resistant genes (antibiotic resistant genes, ARGs), but the required dose is higher than the dose used in conventional sewage treatment plants. Due to the strong tolerance of ARB, the dose used in the current disinfection method cannot effectively remove ARB and ARGs, making resistant bacteria and resistant genes As the effluent enters the downstream rivers and lakes, it promotes the dif

Method used

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  • Oxidation method for removing antibiotic resistance genes and resistant bacteria in sewage
  • Oxidation method for removing antibiotic resistance genes and resistant bacteria in sewage

Examples

Experimental program
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Effect test

Embodiment 1

[0025] Under sterile conditions, take the secondary effluent of the sewage treatment plant and put it into a beaker, add PDS to make the final concentration 1mmol / L, mix well, and use UV intensity of 21μw / cm 2 10 min under the irradiation of ultraviolet light.

Embodiment 2

[0027] Under sterile conditions, take the secondary effluent of the sewage treatment plant and put it into a beaker, add PDS to make the final concentration 0.1mmol / L, mix well, and use a UV intensity of 16μw / cm 2 Treated under the ultraviolet light for 30min.

Embodiment 3

[0029] Under sterile conditions, take the secondary effluent of the sewage treatment plant and put it into a beaker, add PDS to make the final concentration 2mmol / L, mix well, and use a UV intensity of 36μw / cm 2 Treated under the ultraviolet lamp for 60min.

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Abstract

The invention discloses an oxidation method for removing antibiotic resistance genes and resistant bacteria in sewage, and relates to the technical field of advanced sewage treatment. The oxidation method comprises following steps: taking sewage, adding an oxidant, and carrying out an ultraviolet irradiation treatment. A novel advanced oxidation process is adopted, UV is used for activating peroxymonosulfate/peroxydisulfate to generate sulfate free radicals (SO4.-) and hydroxyl free radicals (.OH), and ARGs and ARB are removed through free radicals with high oxidation capacity and damage of UVto bacteria. The advanced oxidation process is environmentally friendly and high in oxidation capacity, does not generate any intermediate pollutant, and has a good removal effect on ARB and ARGs.

Description

technical field [0001] The invention relates to the technical field of advanced sewage treatment, in particular to a method for removing antibiotic resistance genes and resistant bacteria in sewage. Background technique [0002] The advanced treatment process of sewage is an important link to ensure the safe discharge of sewage, so it is of great significance to study the influence of different advanced treatment processes on the removal of pollutants. In the advanced treatment process, disinfection technologies such as chlorination, UV, and ozone have the ability to damage bacterial cells and intracellular DNA, kill antibiotic resistant bacteria (antibiotic resistant bacteria, ARB) and destroy antibiotic resistant genes (antibiotic resistant genes, ARGs), but the required dose is higher than the dose used in conventional sewage treatment plants. Due to the strong tolerance of ARB, the dose used in the current disinfection method cannot effectively remove ARB and ARGs, makin...

Claims

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Application Information

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IPC IPC(8): C02F1/72C02F1/32C02F101/30
CPCC02F1/72C02F1/32C02F2101/30
Inventor 曹广丽周春爽武继文刘冰峰武秀坤王琪
Owner HARBIN INST OF TECH
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