Fe-Pt-OXIDE-BN SINTERED BODY FOR SPUTTERING TARGETS

A fe-pt-, oxide technology, applied in the direction of magnetic objects, sputtering coating, sputtering coating, etc., can solve the problem of reducing product yield

Inactive Publication Date: 2020-10-27
TANAKA PRECIOUS METAL IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

FePt-based magnetic recording media are formed using FePt-based sputtering targets, but particles generated during sputtering reduce product yields, so it is required to reduce the generation of particles

Method used

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  • Fe-Pt-OXIDE-BN SINTERED BODY FOR SPUTTERING TARGETS

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Weigh 640.00g Fe-50Pt atomized powder (average particle size 50μm), 21.89g SiO 2 powder (average particle size less than 1 μm) and 45.22 g BN powder (average particle size 15 μm) to form Fe-35Pt-25BN-5SiO 2 , first Fe-50pt atomized powder (average particle size 50μm) and SiO 2 Powders (average particle size less than 1 μm) were mixed in a ball mill at 450 rpm for 60 hours (intensive mixing) to form composite oxide alloy powders. Next, BN powder (average particle diameter: 15 μm) was added to the composite oxide alloy powder, and further mixed at 300 rpm for 5 minutes (weak mixing), thereby preparing a BN-containing composite oxide alloy powder.

[0059] The composite oxide alloy powder containing BN was sintered under vacuum at a sintering temperature of 830 °C and a sintering pressure of 65.60 MPa to obtain Fe-Pt-SiO for sputtering targets. 2 -BN-based sintered body. The density of the sintered body measured by the Archimedes method was 98.3%. N / B was 1.25, which w...

Embodiment 2～6

[0062] Except having changed to the composition and sintering temperature shown in Table 1, it carried out similarly to Example 1, and obtained the Fe-Pt-oxide-BN system sintered body for sputtering targets. Table 1 shows the measurement results of density, N / B, and particle number. The density is 96% or more, N / B is 1.29 to 1.38, within the range of theoretical value 1.30±0.1, and the number of fine particles is as small as 28 or less. It is considered that the decomposition of BN is suppressed, and the generation of fine particles is suppressed.

Embodiment 7

[0064]Weigh 146.12g Fe powder (average particle size 6μm), 510.41g Pt powder (average particle size 1μm), 39.30g SiO 2 powder (average particle size less than 1 μm) and 16.32 g BN powder (average particle size 15 μm) to form Fe-40Pt-10BN-10SiO 2 , mixed in a ball mill at 300 rpm for 30 minutes.

[0065] The mixture was sintered under vacuum at a sintering temperature of 780 °C and a sintering pressure of 65.60 MPa to obtain Fe-Pt-SiO for sputtering targets. 2 -BN-based sintered body. The density of the sintered body measured by the Archimedes method was 97.0%. N / B was 1.28, which was within the range of the theoretical value of 1.30±0.1, and the number of fine particles was as small as 35. It is considered that the decomposition of BN is suppressed, and the generation of fine particles is suppressed.

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Abstract

Provided is an Fe-Pt-oxide-BN sintered body for high-density sputtering targets, which is capable of suppressing the generation of particles during sputtering. An Fe-Pt-oxide-BN sintered body for sputtering targets, which is configured such that the mass ratio of N to B, namely N/B is within the range of 1.30 plus and minus 0.1.

Description

technical field [0001] The present invention relates to a Fe-Pt-oxide-BN-based sintered body for a sputtering target and a manufacturing method thereof. Background technique [0002] FePt alloys can have an fct (Ordered Face Centered Tetragonal) structure with high magnetocrystalline anisotropy by heat treatment at a high temperature (for example, 600° C. or higher), and thus attract attention as a magnetic recording medium. The FePt-based magnetic recording medium is formed into a film using a FePt-based sputtering target, but particles generated during sputtering reduce product yields, and therefore it is required to reduce the generation of particles. [0003] Various Fe-Pt-based sputtering targets composed of a magnetic phase of FePt alloy and a non-magnetic phase existing between the magnetic phases have been proposed, and SiO is often used as the non-magnetic phase. 2 Other oxides, BN (boron nitride), C, etc. [0004] For example, Patent Document 1 (Japanese Patent N...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B22F3/10C22C1/05C22C5/04C22C32/00G11B5/851G11B5/65
CPCB22F3/10C22C1/05C22C5/04G11B5/65G11B5/851C23C14/3414C22C26/00C22C32/0047C22C1/0466C22C33/0228C22C33/0292H01F41/183C22C32/0005G11B5/653G11B5/656H01F1/047
Inventor 西浦正纮山本孝充黑濑健太小林弘典宫下敬史
Owner TANAKA PRECIOUS METAL IND
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