Welding method for WTi target and copper back plate
A welding method and technology of copper backplane, applied in welding equipment, welding/welding/cutting items, non-electric welding equipment, etc., can solve problems such as short service life, unsatisfactory sputtering effect, and easy cracking of WTi
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Embodiment 1
[0043] This embodiment provides a welding method for a WTi target and a copper back plate. The welding method includes: assembling the WTi target 2, the copper back plate 3 and the cover plate 1, and then putting them into the sheath and removing them sequentially. Gas treatment and welding;
[0044] Wherein, the welding surface of the WTi target 2 is provided with an inverted triangular groove; the welding surface of the copper back plate 3 is sequentially subjected to acid treatment and alkali treatment; 2 is a centrally symmetrical assembly, such as figure 1 shown; the maximum width of the groove is 4mm; the vertical depth of the groove is 1.7mm; the pitch of the groove is 7mm; the acid treatment is to use acid solution to process the copper back plate welding surface; the acid The solution is concentrated hydrochloric acid; the time of the acid treatment is 30min; the alkali treatment is to use an alkali solution to process the welding surface of the copper backboard; the...
Embodiment 2
[0047] This embodiment provides a welding method for a WTi target material and a copper back plate, the welding method includes: assembling the WTi target material, copper back plate and cover plate, and then putting them into a sheath for degassing treatment and welding;
[0048] Wherein, the welding surface of the WTi target is provided with a groove; the welding surface of the copper back plate is sequentially subjected to acid treatment and alkali treatment; the assembly is a symmetrical assembly of the copper back plate and the cover plate centered on the WTi target; The maximum width of the groove is 3mm; the vertical depth of the groove is 2mm; the distance between the grooves is 6mm; the acid treatment is to use an acid solution to process the welding surface of the copper backboard; the acid solution is concentrated nitric acid; The time of the acid treatment is 40min; the alkali treatment is to use an alkali solution to process the welding surface of the copper backb...
Embodiment 3
[0051] This embodiment provides a welding method for a WTi target material and a copper back plate, the welding method includes: assembling the WTi target material, copper back plate and cover plate, and then putting them into a sheath for degassing treatment and welding;
[0052] Wherein, the welding surface of the WTi target is provided with a groove; the welding surface of the copper back plate is sequentially subjected to acid treatment and alkali treatment; the assembly is a symmetrical assembly of the copper back plate and the cover plate centered on the WTi target; The maximum width of the groove is 5mm; the vertical depth of the groove is 1.2mm; the distance between the grooves is 8mm; the acid treatment is to use an acid solution to process the welding surface of the copper backboard; the acid solution is concentrated hydrochloric acid The time of the acid treatment is 20min; the alkali treatment is to use an alkali solution to process the welding surface of the coppe...
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