X-ray detector based on field effect transistor structure and preparation method thereof
A field effect transistor and X-ray technology is applied in the field of X-ray detectors based on field effect transistor structures and their preparation, and can solve the problems of low sensitivity, bulkiness, complicated material growth and preparation process, etc.
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Embodiment 1
[0081] Such as Figure 1a and Figure 1b It is a schematic diagram of the first device structure of the X-ray detector of the present invention, such as Figure 1a , including a substrate 1, located at the bottom of the X-ray detector; a gate electrode 2, the lower surface of the gate electrode 2 is made on the upper surface of the substrate 1; a gate dielectric layer 3, used for insulation, the The lower surface of the gate dielectric layer 3 is made on the upper surface of the gate electrode 2; the semiconductor channel layer 4 is used to transmit charges to generate channel current, and the lower surface of the semiconductor channel layer 4 is made on the said gate electrode 2. The upper surface of the gate dielectric layer 3; the X-ray layer 7 includes an X-ray absorbing layer 5, a source electrode 6-1 and a drain electrode 6-2, and the lower surface of the X-ray layer 7 is made on the semiconductor The upper surface of the channel layer 4, wherein the lower surface of the...
Embodiment 2
[0085] Such as Figure 2a and Figure 2b It is a schematic diagram of the second device structure of the X-ray detector of the present invention, such as Figure 2a , including a substrate 1, located at the bottom of the X-ray detector; a gate electrode 2, the lower surface of the gate electrode 2 is made on the upper surface of the substrate 1; a gate dielectric layer 3, used for insulation, the The lower surface of the gate dielectric layer 3 is made on the upper surface of the gate electrode 2; the semiconductor channel layer 4 is used to transmit charges to generate channel current, and the lower surface of the semiconductor channel layer 4 is made on the said gate electrode 2. The upper surface of the gate dielectric layer 3; the X-ray absorbing layer 5, the lower surface of the X-ray absorbing layer 5 is made on the upper surface of the semiconductor channel layer 4; the source electrode 6-1 and the drain electrode 6-2, the lower surface of the source electrode 6-1 and...
Embodiment 3
[0089] Such as Figure 3a and Figure 3b It is a schematic diagram of the third device structure of the X-ray detector of the present invention, such as Figure 3a , including a substrate 1, located at the bottom of the X-ray detector; a gate electrode 2, the lower surface of the gate electrode 2 is made on the upper surface of the substrate 1; a gate dielectric layer 3, used for insulation, the The lower surface of the gate dielectric layer 3 is made on the upper surface of the gate electrode 2; the semiconductor layer 8 includes a semiconductor channel layer 4, a source electrode 6-1 and a drain electrode 6-2, and the semiconductor layer 8 The lower surface of layer 8 is formed on the upper surface of the gate dielectric layer 3, wherein the lower surface of the semiconductor channel layer 4 is formed in the middle of the upper surface of the gate dielectric layer 3, covering all A part of the upper surface of the gate dielectric layer 3, the source electrode 6-1 and the d...
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