Mask frame

Abstract

The invention discloses a mask frame, which comprises an exposure table and a laser assembly fixed above the exposure table; and the mask frame is characterized in that a fixed adjusting assembly capable of adjusting and fixing masks with different sizes is arranged between the exposure table and the laser assembly, and a threaded rod is driven to rotate by shaking a rotating handle; a first sliding block and a second sliding block in a same movable groove are accurately controlled to move in opposite directions, so that the fixing effect of adjusting masks of different sizes is achieved; thesituation that the masks are damaged due to too fast thread adjustment is avoided through a spring and a check block on the first sliding block, a second sliding block at the opposite position is notprovided with a spring and a check block, so that the position accuracy of the side of the masks is guaranteed. Elastic errors are not generated on the side, the mask is adjusted and located more accurately through cooperation with the extrusion fixing effect of the spring and the baffle on the first sliding block, the friction force between the sliding block and the bottom face of the mask in theadjusting process is reduced through rolling wheels, and abrasion to the mask in the adjusting process is reduced.

Description

technical field [0001] The invention relates to the technical field of masks, in particular to a mask shelf. Background technique [0002] Reticle, referred to as mask for short, is an indispensable part of the photolithography process. The mask bears the design pattern, and the light passes through it, and the design pattern is transmitted on the photoresist. The performance of the mask directly determines the quality of the photolithography process. In a projection lithography machine, the mask is used as an optical element between the converging lens and the projection lens, and it does not have direct contact with the wafer. The pattern on the mask is reduced by 4 to 10 times and then transmitted on the wafer surface. In order to distinguish the mask used in contact exposure, the mask used in projection exposure is also called a reduction mask. [0003] The mask is mainly composed of aluminum alloy frame and quartz glass with high light transmission performance in th...

AI Technical Summary

Problems solved by technology

[0004] When the lithography machine is in use, it is necessary to fix the reticles of different sizes before etching the reticle. The existing lithography machine manually aligns the reticle with the scale, which is inconvenient to adjust and the precision is not high, so that the aluminum alloy frame There is a deviation between the outer logo sensing area and the corresponding component position, resulting in poor contact and poor graphics projection quality. For this reason, we propose a mask shelf

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