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A kind of island-shaped Al thin film with Cu foil as substrate and its preparation method and application

A substrate and film technology, which is applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problems such as failure to meet the requirements for the use of negative electrodes of Li-ion battery materials, Al metal powder, and performance failure, etc. Achieving multiple reactive active sites, slowing down the speed of surface pulverization, and solving pulverization problems

Active Publication Date: 2021-11-19
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the problems existing in the prior art, the present invention provides an island-shaped Al thin film with Cu foil as the substrate and its preparation method and application, which solves the serious volume expansion and contraction of the Al negative electrode during the charge and discharge process, which cannot reach the Li ion density. The use requirements of the negative electrode of the battery material lead to the problems of Al metal powdering and performance failure

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  • A kind of island-shaped Al thin film with Cu foil as substrate and its preparation method and application
  • A kind of island-shaped Al thin film with Cu foil as substrate and its preparation method and application
  • A kind of island-shaped Al thin film with Cu foil as substrate and its preparation method and application

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preparation example Construction

[0028] The method for preparing an island-shaped Al thin film with Cu foil as a substrate of the present invention comprises the following steps:

[0029] 1) Ultrasonic cleaning of the Cu foil substrate;

[0030] 2) drying the cleaned Cu foil substrate;

[0031] 3) Place the processed Cu foil substrate in the magnetron sputtering fixture, install the Al target on the target base, and adjust the target distance; the background vacuum is controlled at 10 -4 Pa, using argon to adjust the pressure of the sputtering chamber at 10 -3 ~10 -2 Within the range of Pa; adopt DC sputtering method to sputter to obtain Al monolayer film, and the sputtering time is 30s-5min, preferably 1-5min.

[0032] In step 1), the Cu foil substrate is ultrasonically cleaned for at least 10 min using absolute ethanol and deionized water in sequence.

[0033] In step 2), the cleaned Cu foil substrate is blown dry with high-purity argon to dry the solution on the surface.

[0034] In step 3), an Al tar...

Embodiment 1

[0038] The implementation process of the island-shaped Al thin film of the present invention comprises the following steps:

[0039] 1) Place the Cu foil substrate in anhydrous ethanol and deionized water in sequence to ultrasonically clean the substrate for 10 minutes;

[0040] 2) Drying the cleaned Cu foil substrate with high-purity nitrogen gas with a purity of 99.99%;

[0041] 3) Place the processed Cu foil substrate in the magnetron sputtering fixture, install the Al target on the target base, and adjust the target distance;

[0042] 4) The background vacuum of the sputtering chamber is at 10 -4 Pa, Cu foil substrate and Al target are first placed in the sampling chamber, and the sampling chamber is evacuated. When the pressure difference between the sputtering chamber and the sampling chamber is less than 10 times, the Cu foil substrate to be coated is fed into it; Adjust the gas pressure in the sputtering chamber at 10 -3 ~10 -2 Within the Pa range; adjust the rotat...

Embodiment 2

[0046] The implementation process of the island-shaped Al thin film of the present invention comprises the following steps:

[0047] 1) Place the Cu foil substrate in anhydrous ethanol and deionized water in sequence to ultrasonically clean the substrate for 10 minutes;

[0048] 2) Drying the cleaned Cu foil substrate with high-purity nitrogen gas with a purity of 99.99%;

[0049] 3) Place the processed Cu foil substrate in the magnetron sputtering fixture, install the Al target on the target base, and adjust the target distance;

[0050] 4) The background vacuum of the sputtering chamber is at 10 -4 Pa, Cu foil substrate and Al target are first placed in the sampling chamber, and the sampling chamber is evacuated. When the pressure difference between the sputtering chamber and the sampling chamber is less than 10 times, the Cu foil substrate to be coated is fed into it; Adjust the gas pressure in the sputtering chamber at 10 -3 ~10 -2 Within the Pa range; adjust the rotat...

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Abstract

The invention provides an island-shaped Al thin film with Cu foil as the substrate and its preparation method and application. The Cu foil substrate is used as the substrate, and the Al target is used as the target material, and a layer of Al thin film is magnetron sputtered on the Cu foil substrate. , the magnetron sputtering time is 10s‑5min. The invention solves the problems of serious volume expansion and shrinkage of the Al negative electrode in the process of charging and discharging, which fails to meet the use requirements of the negative electrode of the Li ion battery material, resulting in Al metal powdering and performance failure.

Description

technical field [0001] The invention belongs to the field of lithium ion batteries, and in particular relates to an island-shaped Al thin film with Cu foil as a substrate, a preparation method and application thereof. Background technique [0002] The negative electrode of the lithium-ion battery is made of a negative electrode active material carbon material or non-carbon material, a binder and a conductive agent mixed to form a paste-like adhesive that is evenly spread on both sides of the copper foil, dried and rolled. Whether lithium-ion batteries can be successfully manufactured depends on whether anode materials that can reversibly extract / intercalate lithium ions can be prepared. Generally speaking, the selection of a good anode material should follow the following principles: high specific energy; low electrode potential relative to lithium electrodes; good reversibility of charge and discharge reactions; good compatibility with electrolyte and binder; small specific...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/16C23C14/35
CPCC23C14/165C23C14/35
Inventor 李龙宋忠孝丁书江于广泳李雁淮孟瑜张娜
Owner XI AN JIAOTONG UNIV
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